Philip Kulse

City:

Frankfurt (Oder)

Country:

Germany

Published Applications:

Last publication date:

2018-10-04

Top Assignees for applications by Philip Kulse

The entities that hold a legal rights for patent applications filed by inventor Kulse Philip:

IHP GMBH—INNOVATIONS FOR HIGH PERFORMANCE MICROELECTRONICS/LEIBNIZ-INSTITUT FUR INNOVATIVE MIKROELEKTRONIK 1 Frankfurt, Germany

Recent patent applications by Kulse Philip

Philip Kulse from Frankfurt (Oder), DE has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2018-10-04

US20180286751A1

Electricity

Technological method for preventing, by means of buried etch stop layers, the creation of vertical/lateral inhomogeneities when etching through-silicon vias

InventorID:

2315438 ⎘