Oberkochen
Germany
42
2022-06-30
The entities that hold a legal rights for patent applications filed by inventor Holderer Hubert:
Hubert Holderer from Oberkochen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
Facet mirror for an illumination optical unit of a projection exposure apparatus
#2 | 2022-02-24Measurement illumination optical unit for guiding illumination light into an object field of a projection exposure system for EUV lithography
#3 | 2021-01-07Beam-forming and illuminating system for a lithography system, lithography system, and method
#4 | 2020-11-05Imaging optical unit for EUV microlithography
#5 | 2020-04-09Method for producing an illumination system for an EUV projection exposure system, and illumination system
#6 | 2018-12-27Method for producing an illumination system for an EUV projection exposure system, and illumination system
#7 | 2018-06-28OPTICAL IMAGING DEVICE WITH THERMAL ATTENUATION
#8 | 2015-04-23Optical imaging device with thermal attenuation
#9 | 2013-05-09Optical imaging device with thermal attenuation
#10 | 2012-06-21Holding arrangement for an optical element
#11 | 2012-06-07Holding arrangement for an optical element
#12 | 2011-08-18Imaging device in a projection exposure facility
#13 | 2011-08-02Projection objective of a microlithographic projection exposure apparatus
#14 | 2011-03-03Reflective optical element for use in an EUV system
#15 | 2011-02-03Optical system having heat dissipation arrangement
#16 | 2009-06-04Composite structure for microlithography and optical arrangement
#17 | 2009-06-04Imaging Device in a Projection Exposure Machine
#18 | 2009-05-28Optical imaging device with thermal attenuation
#19 | 2009-02-12Imaging device in a projection exposure facility
#20 | 2009-01-15Apparatus for mounting two or more elements and method for processing the surface of an optical element
#21 | 2009-01-08Adjustment arrangement of an optical element
#22 | 2008-10-02Projection objective of a microlithographic projection exposure apparatus
#23 | 2008-06-19Projection method including pupillary filtering and a projection lens therefor
#24 | 2008-05-01Optical measuring system, and a projection objective
#25 | 2008-05-01ARRANGEMENT OF TWO CONNECTED BODIES
#26 | 2007-12-13Support structure for temporarily supporting a substrate
#27 | 2007-12-04Imaging device in a projection exposure facility
#28 | 2007-09-27Holding and positioning apparatus for an optical element
#29 | 2007-07-26Method for connection of an optical element to a mount structure
#30 | 2007-03-20Adjustment arrangement of an optical element
#31 | 2006-11-02Process for connecting an optical element of a microlithographic projection exposure apparatus to a mount, and assembly
#32 | 2006-08-24Microlithographic projection exposure apparatus
#33 | 2006-07-27Imaging device in a projection exposure machine
#34 | 2006-01-19Objective, in particular a projection objective in microlithography
#35 | 2006-01-12Holding and positioning apparatus for an optical element
#36 | 2005-12-29Objective, especially a projection objective for microlithography
#37 | 2005-12-01Projection lens and microlithographic projection exposure apparatus
#38 | 2005-11-10Device for holding a beam splitter element
#39 | 2005-09-13Method for correcting oscillation-induced imaging errors in an objective
#40 | 2005-06-23PROJECTION LENS AND MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
#41 | 2005-05-26Device for manipulating the angular position of an object relative to a fixed structure
#42 | 2005-02-10Facet mirror having a number of mirror facets
232389 ⎘