Inventor profile of:

Daniel LOEFFLER

City:

Ludwigshafen

Country:

Germany

Published Applications:

17

Last publication date:

2026-02-12

Top Assignees for applications by Daniel LOEFFLER

The entities that hold a legal rights for patent applications filed by inventor LOEFFLER Daniel:

  • BASF SE 10 Ludwigshafen am Rhein, Germany
  • BASF SE 1 Ludwigshafen, Germany

Recent patent applications by LOEFFLER Daniel

Daniel LOEFFLER from Ludwigshafen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2026-02-12
US20260043133A1
Chemistry; metallurgy

PROCESS FOR PREPARING COATED ORGANIC PARTICLES

#2 | 2026-02-12
US20260041086A1
Human necessities

PROCESS FOR PREPARING COATED ORGANIC PARTICLES

#3 | 2026-02-05
US20260035785A1
Chemistry; metallurgy

PROCESS FOR PREPARING COATED ORGANIC PARTICLES

#4 | 2024-05-23
US20240166977A1
Chemistry; metallurgy

PROCESS FOR MAKING A PARTICULATE COATED ORGANIC SALT, AND PARTICULATE COATED SALT

#5 | 2023-08-31
US20230274930A1
Electricity

Composition Comprising a Siloxane and an Alkane for Avoiding Pattern Collapse When Treating Patterned Materials with Line-Space Dimensions of 50 NM or Below

#6 | 2023-07-27
US20230235252A1
Chemistry; metallurgy

Use of a Composition Consisting of Ammonia and an Alkanol for Avoiding Pattern Collapse When Treating Patterned Materials with Line-Space Dimensions of 50 NM or Below

#7 | 2022-09-15
US20220290050A1
Chemistry; metallurgy

Composition, its use and a process for selectively etching silicon-germanium material

#8 | 2022-06-16
US20220187712A1
Physics

COMPOSITION FOR AVOIDING PATTERN COLLAPSE WHEN TREATING PATTERNED MATERIALS WITH LINE-SPACE DIMENSIONS OF 50 NM OR BELOW COMPRISING A BORON-TYPE ADDITIVE

#9 | 2022-06-02
US20220169956A1
Chemistry; metallurgy

COMPOSITION COMPRISING AN AMMONIA-ACTIVATED SILOXANE FOR AVOIDING PATTERN COLLAPSE WHEN TREATING PATTERNED MATERIALS WITH LINE-SPACE DIMENSIONS OF 50 NM OR BELOW

#10 | 2021-07-01
US20210198602A1
Chemistry; metallurgy

Use of compositions comprising a solvent mixture for avoiding pattern collapse when treating patterned materials with line-space dimensions of 50 nm or below

#11 | 2020-08-13
US20200255772A1
Chemistry; metallurgy

Use of compositions comprising a siloxane-type additive for avoiding pattern collapse when treating patterned materials with line-space dimensions of 50 nm or below

#12 | 2019-12-26
US20190393494A1
Electricity

Process for coating an oxide material

#13 | 2019-11-28
US20190360096A1
Chemistry; metallurgy

PROCESS FOR THE GENERATION OF METAL-CONTAINING FILMS

#14 | 2019-08-15
US20190248821A1
Chemistry; metallurgy

PROCESS FOR THE GENERATION OF THIN INORGANIC FILMS

#15 | 2019-05-16
US20190144999A1
Chemistry; metallurgy

PROCESS FOR THE GENERATION OF THIN INORGANIC FILMS

#16 | 2019-01-03
US20190003049A1
Chemistry; metallurgy

Process for the generation of thin inorganic films

#17 | 2018-11-08
US20180320265A1
Chemistry; metallurgy

Process for the generation of thin inorganic films

InventorID:

2342782 ⎘