Hsinchu
Taiwan
19
2026-05-07
The entities that hold a legal rights for patent applications filed by inventor LIN Ping-Hsun:
Ping-Hsun LIN from Hsinchu, TW has applied for patents for these inventions. The list has both pending applications and granted patents:
EXTREME ULTRAVIOLET MASK WITH ALLOY BASED ABSORBERS
#2 | 2025-11-27LITHOGRAPHY MASK HAVING HIGH EXTINCTION COEFFICIENT ABSORBER AND RELATED SYSTEMS AND METHODS
#3 | 2025-11-27EXTREME ULTRAVIOLET MASK WITH CAPPING LAYER
#4 | 2025-10-09REFLECTIVE MASKS AND METHODS OF MANUFACTURING SEMICONDUCTOR DEVICE
#5 | 2025-10-02OPTICAL ASSEMBLY WITH COATING AND METHODS OF USE
#6 | 2025-09-25REFLECTIVE MASK AND METHOD OF MAKING SEMICONDUCTOR DEVICE
#7 | 2025-04-17LITHOGRAPHY MASK HAVING HIGH EXTINCTION COEFFICIENT ABSORBER AND RELATED SYSTEMS AND METHODS
#8 | 2024-03-21PHOTOMASK INCLUDING FIDUCIAL MARK AND METHOD OF MAKING A PHOTOMASK
#9 | 2023-12-21OPTICAL ASSEMBLY WITH COATING AND METHODS OF USE
#10 | 2023-11-23EXTREME ULTRAVIOLET MASK WITH ALLOY BASED ABSORBERS
#11 | 2023-11-23EUV mask blank and method of making EUV mask blank
#12 | 2023-05-25EXTREME ULTRAVIOLET MASK WITH CAPPING LAYER
#13 | 2022-12-01Extreme ultraviolet mask with alloy based absorbers
#14 | 2022-11-10Photomask including fiducial mark and method of making a semiconductor device using the photomask
#15 | 2022-10-27EUV mask blank and method of making EUV mask blank
#16 | 2022-08-18OPTICAL ASSEMBLY WITH COATING AND METHODS OF USE
#17 | 2021-09-16Photomask including fiducial mark and method of making semiconductor device using the photomask
#18 | 2019-08-22Photomask including fiducial mark, method of patterning the photomask and method of making semiconductor device using the photomask
#19 | 2018-12-20Photomask including fiducial mark, method of patterning the photomask and method of making semiconductor device using the photomask
2379042 ⎘