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Inventor profile of:

Minfeng Chen

City:

Hsinchu

Country:

Taiwan

Published Applications:

Last publication date:

2025-06-19

Top Assignees for applications by Minfeng Chen

The entities that hold a legal rights for patent applications filed by inventor Chen Minfeng:

TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 6 Hsinchu, Taiwan
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 6 Hsinchu, Taiwan
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 1 Hsin-Chu, Taiwan

Recent patent applications by Chen Minfeng

Minfeng Chen from Hsinchu, TW has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2025-06-19

US20250199408A1

Physics

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

#2 | 2023-10-19

US20230333486A1

Physics

Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor device

#3 | 2023-05-18

US20230152709A1

Physics

SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

#4 | 2023-01-05

US20230004087A1

Physics

Method of manufacturing a semiconductor device

#5 | 2022-08-18

US20220260931A1

Physics

Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor device

#6 | 2021-04-01

US20210096475A1

Physics

Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor device

#7 | 2021-03-18

US20210080822A1

Physics

Method for forming photomask and photolithography method

#8 | 2020-10-01

US20200312835A1

Electricity

Photomask design for generating plasmonic effect

#9 | 2020-06-04

US20200174382A1

Physics

Pellicle structure for lithography mask

#10 | 2020-04-23

US20200124978A1

Physics

Extreme ultraviolet (EUV) polarization splitter

#11 | 2020-02-06

US20200041915A1

Physics

Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor device

#12 | 2019-05-30

US20190163051A1

Physics

Method for forming photomask and photolithography method

#13 | 2019-01-03

US20190006343A1

Electricity

Photomask design for generating plasmonic effect

InventorID:

2394367 ⎘