Pingzchen
Taiwan
62
2024-09-05
The entities that hold a legal rights for patent applications filed by inventor WANG SHIANG-BAU:
SHIANG-BAU WANG from Pingzchen, TW has applied for patents for these inventions. The list has both pending applications and granted patents:
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR DEVICE
#2 | 2024-04-18METHOD OF MANUFACTURING A SEMICONDUCTOR DEVCE
#3 | 2023-11-23SEMICONDUCTOR DEVICE AND METHOD
#4 | 2023-10-26Partial directional etch method and resulting structures
#5 | 2023-08-10Air spacer and method of forming same
#6 | 2023-04-13Semiconductor device and method
#7 | 2023-03-02Method of manufacturing a semiconductor device and a semiconductor device
#8 | 2022-10-13Partial directional etch method and resulting structures
#9 | 2022-09-08Air spacer and method of forming same
#10 | 2022-08-18Semiconductor device and method of manufacture
#11 | 2022-02-24Cut-fin isolation regions and method forming same
#12 | 2021-12-30Air spacer and method of forming same
#13 | 2021-11-11Semiconductor device and method
#14 | 2021-08-26Partial directional etch method and resulting structures
#15 | 2021-08-05Metal gate structure cutting process
#16 | 2021-07-22Semiconductor device and method of manufacture
#17 | 2021-03-25Method of manufacturing a semiconductor device
#18 | 2021-03-11Semiconductor device and method
#19 | 2020-11-19Semiconductor wafer measurement method and system
#20 | 2020-06-04Method of manufacturing a semiconductor device
#21 | 2020-04-23Semiconductor device and method
#22 | 2020-04-02Semiconductor device and method
#23 | 2020-02-06Cut-fin isolation regions and method forming same
#24 | 2020-01-02Lithography mask and method
#25 | 2019-08-22Semiconductor wafer measurement method and system
#26 | 2019-05-02Semiconductor structure with etched fin structure
#27 | 2019-04-11Metal gate structure cutting process
#28 | 2019-01-03Metal gate structure cutting process
#29 | 2019-01-03Lithography mask and method
#30 | 2017-09-07Semiconductor structure with etched fin structure
#31 | 2017-03-30Intelligent metrology based on module knowledge
#32 | 2017-02-02Method of forming metal gate to mitigate antenna defect
#33 | 2016-06-23Method for forming semiconductor structure with etched fin structure
#34 | 2016-03-03Fin field effect transistor (FinFET) device with protection layer
#35 | 2015-12-31Dimension measurement apparatus calibration standard and method for forming the same
#36 | 2015-12-17Integrated circuit having a contact etch stop layer
#37 | 2014-06-19Sidewall-free CESL for enlarging ILD gap-fill window
#38 | 2014-03-13Method of dual EPI process for semiconductor device
#39 | 2014-03-13Method of dual epi process for semiconductor device
#40 | 2014-02-27Isolation structure profile for gap filing
#41 | 2014-02-27Isolation structure profile for gap filing
#42 | 2014-01-09Wafer alignment system and method
#43 | 2013-12-19Semiconductor structure and method
#44 | 2013-10-17Sidewall free CESL for enlarging ILD gap-fill window
#45 | 2013-08-01End-to-end gap fill using dielectric film
#46 | 2013-05-23Process for forming a metal oxide semiconductor devices
#47 | 2013-05-23Epitaxial process for forming semiconductor devices
#48 | 2013-05-16Hard mask removal method
#49 | 2013-01-17Epitaxial process for forming semiconductor devices
#50 | 2012-08-30Post CMP planarization by cluster ion beam etch
#51 | 2012-08-16Isolation structure profile for gap filling
#52 | 2012-08-16End-to-end gap fill using dielectric film
#53 | 2012-04-26Integrated circuit having a contact etch stop layer and method of forming the same
#54 | 2012-01-05Method of fabricating integrated circuit device, including removing at least a portion of a spacer
#55 | 2011-12-22Post CMP planarization by cluster ION beam etch
#56 | 2011-09-22Method of fabricating gate electrode using a hard mask with spacers
#57 | 2011-08-18Method of dual EPI process for semiconductor device
#58 | 2011-08-11Hard mask removal method
#59 | 2011-08-11Method of fabricating gate electrode using a treated hard mask
#60 | 2011-07-14Multilayer hard mask
#61 | 2011-05-24Method of forming a shallow trench isolation structure
#62 | 2011-01-13STI structure and method of forming bottom void in same
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