Inventor profile of:

Yuling LIU

City:

Tianjin

Country:

China

Published Applications:

10

Last publication date:

2013-05-30

Top Assignees for applications by Yuling LIU

The entities that hold a legal rights for patent applications filed by inventor LIU Yuling:

Recent patent applications by LIU Yuling

Yuling LIU from Tianjin, CN has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2013-05-30
US20130133691A1
Performing operations; transporting

METHOD OF CLEANING TUNGSTEN PLUG SURFACES IN ULTRA LARGE SCALE INTEGRATED CIRCUITS AFTER CHEMICAL-MECHANICAL POLISHING

#2 | 2013-05-16
US20130123158A1
Chemistry; metallurgy

Method of cleaning copper material surfaces in ultra large scale integrated circuits after polishing the same

#3 | 2013-05-16
US20130118522A1
Performing operations; transporting

METHOD OF CLEANING MULTILAYER COPPER WIRINGS IN ULTRA LARGE SCALE INTEGRATED CIRCUITS AFTER CHEMICAL-MECHANICAL POLISHING

#4 | 2012-12-20
US20120321780A1
Chemistry; metallurgy

METHOD OF PREVENTING OXIDATION OF MULTILAYER WIRINGS IN ULTRA LARGE SCALE INTEGRATED CIRCUITS AFTER ALKALINE POLISHING

#5 | 2012-12-20
US20120318293A1
Electricity

METHOD OF CLEANING WAFER SURFACES AFTER POLISHING ALUMINUM WIRINGS IN ULTRA LARGE SCALE INTEGRATED CIRCUITS

#6 | 2012-12-13
US20120315764A1
Electricity

Method of polishing copper wiring surfaces in ultra large scale integrated circuits

#7 | 2008-02-07
US20080032606A1
Electricity

METHOD FOR CONTROLLING THE DISHING PROBLEM ASSOCIATED WITH CHEMICAL-MECHANICAL PLANARIZATION (CMP) DURING MANUFACTURE OF COPPER MULTILAYER INTERCONNECTION STRUCTURES IN ULTRA LARGE-SCALE INTEGRATED CIRCUITS (ULSI)

#8 | 2007-12-27
US20070298690A1
Performing operations; transporting

Method of eliminating surface stress of silicon wafer

#9 | 2007-12-06
US20070278447A1
Chemistry; metallurgy

Slurry for chemical-mechanical planarization of sapphire and method for manufacturing the same

#10 | 2007-12-06
US20070277847A1
Electricity

Method for removing contaminants from silicon wafer surface

InventorID:

240712 ⎘