Tokyo
Japan
4
2014-05-29
The entities that hold a legal rights for patent applications filed by inventor TAKEBE Yoko:
Yoko TAKEBE from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
Pellicle for lithography, pellicle-mounted photomask, and exposure treatment method
#2 | 2013-05-16FLUORINE-CONTAINING AROMATIC COMPOUND, ORGANIC SEMICONDUCTOR MATERIAL AND ORGANIC THIN FILM DEVICE
#3 | 2012-06-21COATING MATERIAL COMPOSITION FOR LIQUID IMMERSION EXPOSURE APPARATUS, LAMINATE, METHOD FOR FORMING LAMINATE, AND LIQUID IMMERSION EXPOSURE APPARATUS
#4 | 2007-04-12Fluorocopolymer, method for its production and resist composition containing it
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