Aalen
Germany
30
2020-01-23
The entities that hold a legal rights for patent applications filed by inventor GERHARD Michael:
Michael GERHARD from Aalen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
Method for detecting particles on the surface of an object, wafer, and mask blank
#2 | 2019-05-09Optical grating and optical assembly for same
#3 | 2017-07-06Illumination system for microlithography
#4 | 2016-06-09Illumination system for microlithography
#5 | 2016-01-28Method for determining the phase angle and/or the thickness of a contamination layer at an optical element and EUV lithography apparatus
#6 | 2015-01-22Illumination system for microlithography
#7 | 2014-06-26Microlithographic illumination system
#8 | 2013-07-25Method for operating a projection exposure tool and control apparatus
#9 | 2013-05-16Substrates for mirrors for EUV lithography and their production
#10 | 2012-10-04Optical beam deflecting element, illumination system including same, and related method
#11 | 2012-01-26Illumination system for microlithography
#12 | 2011-04-14Optical integrator for an illumination system of a microlithographic projection exposure apparatus
#13 | 2009-08-13Optical element and illumination optics for microlithography
#14 | 2009-01-22Optical integrator for an illumination system of a microlithographic projection exposure apparatus
#15 | 2009-01-22Microlithographic illumination system
#16 | 2008-08-07Polarization rotator and a crystalline-quartz plate for use in an optical imaging system
#17 | 2008-03-06CATADIOPTRIC PROJECTION OBJECTIVE WITH ADAPTIVE MIRROR AND PROJECTION EXPOSURE METHOD
#18 | 2008-02-28PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY
#19 | 2007-06-21Polarization rotator and a crystalline-quartz plate for use in an optical imaging system
#20 | 2007-02-20Objective with fluoride crystal lenses
#21 | 2007-01-18Microlithography projection objective including deformable mirror with adjusting elements and systems and methods using the same
#22 | 2006-12-05Objective with fluoride crystal lenses
#23 | 2006-09-26Catadioptric projection objective with adaptive mirror and projection exposure method
#24 | 2006-08-03Objective with fluoride crystal lenses
#25 | 2006-06-08Polarization rotator and a crystalline-quartz plate for use in an optical imaging system
#26 | 2005-08-30Process for the decontamination of microlithographic projection exposure devices
#27 | 2005-06-23Projection objective for microlithography
#28 | 2005-06-09Objective with fluoride crystal lenses
#29 | 2005-05-10Method and apparatus for analysis of schlieren
#30 | 2005-01-11Objective with lenses made of a crystalline material
244635 ⎘