Neu-Ulm
Germany
21
2026-06-04
The entities that hold a legal rights for patent applications filed by inventor Koch Markus:
Markus Koch from Neu-Ulm, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
PARTICLE-OPTICAL ARRANGEMENT, FOR EXAMPLE MULTI-BEAM PARTICLE MICROSCOPE, WITH A MAGNET ARRANGEMENT FOR SEPARATING A PRIMARY AND A SECONDARY PARTICLE-OPTICAL BEAM PATH WITH IMPROVED PERFORMANCE
#2 | 2025-12-04MULTI-BEAM CHARGED PARTICLE MICROSCOPE DESIGN WITH ADAPTIVE DETECTION SYSTEM
#3 | 2025-11-13MULTI-BEAM CHARGED PARTICLE MICROSCOPE DESIGN WITH A DETECTION UNIT FOR FAST COMPENSATION OF CHARGING EFFECTS
#4 | 2025-11-06FAST CLOSED-LOOP CONTROL OF MULTI-BEAM CHARGED PARTICLE SYSTEM
#5 | 2025-09-25MULTI-BEAM CHARGED PARTICLE MICROSCOPE DESIGN WITH DETECTION SYSTEM FOR FAST CHARGE COMPENSATION
#6 | 2025-06-26PARTICLE-OPTICAL ARRANGEMENT, IN PARTICULAR MULTI-BEAM PARTICLE MICROSCOPE, WITH A MAGNET ARRANGEMENT FOR SEPARATING A PRIMARY AND A SECONDARY PARTICLE-OPTICAL BEAM PATH
#7 | 2025-06-26OPTICAL SYSTEM FOR A METROLOGY SYSTEM AND METROLOGY SYSTEM WITH SUCH AN OPTICAL SYSTEM
#8 | 2025-02-06MASK INSPECTION DEVICE FOR PHOTOMASKS OF EUV LITHOGRAPHY AND CARRIER ELEMENT FOR USE IN A MASK INSPECTION DEVICE
#9 | 2024-10-31METHOD FOR SIMULATING ILLUMINATION AND IMAGING PROPERTIES OF AN OPTICAL PRODUCTION SYSTEM DURING THE ILLUMINATION AND IMAGING OF AN OBJECT BY MEANS OF AN OPTICAL MEASUREMENT SYSTEM
#10 | 2024-03-14METHOD AND APPARATUS FOR QUALIFYING A MASK FOR USE IN LITHOGRAPHY
#11 | 2023-04-27Method for reproducing a target wavefront of an imaging optical production system, and metrology system for carrying out the method
#12 | 2022-12-08METHOD FOR DETERMINING AN IMAGING QUALITY OF AN OPTICAL SYSTEM WHEN ILLUMINATED BY ILLUMINATION LIGHT WITHIN A PUPIL TO BE MEASURED
#13 | 2022-12-01METHOD FOR DETERMINING AN IMAGING QUALITY OF AN OPTICAL SYSTEM WHEN ILLUMINATED BY ILLUMINATION LIGHT WITHIN AN ENTRANCE PUPIL TO BE MEASURED
#14 | 2022-07-28METHOD FOR MEASURING A REFLECTIVITY OF AN OBJECT FOR MEASUREMENT LIGHT AND METROLOGY SYSTEM FOR CARRYING OUT THE METHOD
#15 | 2022-02-24METHOD FOR APPROXIMATING IMAGING PROPERTIES OF AN OPTICAL PRODUCTION SYSTEM TO THOSE OF AN OPTICAL MEASUREMENT SYSTEM, AND METROLOGY SYSTEM TO THIS END
#16 | 2020-11-19Method and device for characterizing a mask for microlithography
#17 | 2019-12-26Method for detecting a structure of a lithography mask and device for carrying out the method
#18 | 2019-08-22Method for determining a focus position of a lithography mask and metrology system for carrying out such a method
#19 | 2019-08-22Method for determining a structure-independent contribution of a lithography mask to a fluctuation of the linewidth
#20 | 2019-08-22Method for determining an imaging aberration contribution of an imaging optical unit for measuring lithography masks
#21 | 2019-03-14Method for examining photolithographic masks and mask metrology apparatus for performing the method
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