Beijing
China
20
2026-06-18
The entities that hold a legal rights for patent applications filed by inventor XU Xiaoxin:
Xiaoxin XU from Beijing, CN has applied for patents for these inventions. The list has both pending applications and granted patents:
RESERVOIR COMPUTING NETWORK OPTIMIZATION METHOD AND RELATED APPARATUS
#2 | 2026-03-26METHOD AND APPARATUS OF PREDICTING ENDURANCE OF CHIP, MEDIUM, AND ELECTRONIC DEVICE
#3 | 2026-01-22SERVICE LIFE PREDICTION AND REPAIR METHOD FOR RESISTIVE RANDOM ACCESS MEMORY CHIP
#4 | 2025-08-21METHOD FOR OPERATING MEMORY CELL AND RESISTIVE RANDOM ACCESS MEMORY, AND ELECTRONIC DEVICE
#5 | 2024-08-01METHOD FOR PREPARING RESERVOIR ELEMENT
#6 | 2024-04-18THREE-DIMENSIONAL RESERVOIR BASED ON VOLATILE THREE-DIMENSIONAL MEMRISTOR AND MANUFACTURING METHOD THEREFOR
#7 | 2024-04-11ACTIVATION FUNCTION GENERATOR BASED ON MAGNETIC DOMAIN WALL DRIVEN MAGNETIC TUNNEL JUNCTION AND MANUFACTURING METHOD
#8 | 2024-01-18RESISTIVE RANDOM ACCESS MEMORY AND METHOD OF PREPARING THE SAME
#9 | 2023-11-16Memory circuit structure and method of operating memory circuit structure
#10 | 2023-06-22MEMORY CELL STRUCTURE, MEMORY ARRAY STRUCTURE, AND VOLTAGE BIASING METHOD
#11 | 2023-04-20Reconfigurable PUF device based on fully electric field-controlled domain wall motion
#12 | 2022-06-02Neural network operation device
#13 | 2022-04-21MEMORY
#14 | 2022-04-14Writing method and erasing method of fusion memory
#15 | 2022-03-24Fusion memory
#16 | 2021-09-23RESISTIVE RANDOM ACCESS MEMORY AND METHOD FOR PREPARING THE SAME
#17 | 2020-06-041S1R memory integrated structure with larger selector surface area which can effectively suppress leakage current in the cross array without increasing the overall size of the integrated structure and method for fabricating the same
#18 | 2020-02-20SELECTOR BASED ON TRANSITION METAL OXIDE AND PREPARATION METHOD THEREFOR
#19 | 2019-04-18Selection device for use in bipolar resistive memory and manufacturing method therefor
#20 | 2019-03-14Self-gating resistive storage device having resistance transition layer in vertical trench in stacked structure of insulating dielectric layers and electrodes
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