Hsinchu
Taiwan
299
2026-06-11
The entities that hold a legal rights for patent applications filed by inventor Chen Li-Jui:
Li-Jui Chen from Hsinchu, TW has applied for patents for these inventions. The list has both pending applications and granted patents:
DROPLET GENERATOR AND METHOD OF SERVICING EXTREME ULTRAVIOLET IMAGING TOOL
#2 | 2026-06-11EXCITATION LASER SYSTEM, METHOD OF OPERATING EXCITATION LASER SYSTEM, AND EXTREME ULTRAVIOLET PHOTOLITHOGRAPY APPARATUS INCLUDING EXCITATION LASER SYSTEM
#3 | 2026-06-04SYSTEM AND METHOD FOR OMNIDIRECTIONAL REAL TIME DETECTION OF PHOTOLITHOGRAPHY CHARACTERISTICS
#4 | 2026-04-09METHODS OF MANUFACTURING SEMICONDUCTOR DEVICE AND EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY SYSTEMS
#5 | 2026-03-19EUV RADIATION SOURCE APPARATUS FOR LITHOGRAPHY
#6 | 2026-03-12METHODS OF CLEANING A LITHOGRAPHY SYSTEM
#7 | 2025-12-18INSPECTION SYSTEM WITH GRAY LEVEL COMPENSATION AND METHOD
#8 | 2025-11-27LITHOGRAPHY SYSTEM AND METHODS
#9 | 2025-11-27LITHOGRAPHY SYSTEM AND METHODS
#10 | 2025-11-13LITHOGRAPHY APPARATUS AND METHOD
#11 | 2025-10-16METHOD AND APPARATUS FOR REMOVING CONTAMINATION
#12 | 2025-10-16SYSTEM AND METHOD FOR DETECTING DEBRIS IN A PHOTOLITHOGRAPHY SYSTEM
#13 | 2025-10-16RADIATION COLLECTOR
#14 | 2025-09-11LITHOGRAPHY SYSTEM AND METHODS
#15 | 2025-08-28TARGET CONTROL IN EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEMS USING ABERRATION OF REFLECTION IMAGE
#16 | 2025-07-17EUV WAFER DEFECT IMPROVEMENT AND METHOD OF COLLECTING NONCONDUCTIVE PARTICLES
#17 | 2025-05-22SYSTEM AND METHOD FOR DYNAMICALLY CONTROLLING TEMPERATURE OF THERMOSTATIC RETICLES
#18 | 2025-05-22APPARATUSES AND METHODS FOR REDUCING PARTICLE CONTAMINATION OF WAFERS DURING TRANSFER
#19 | 2025-05-22LITHOGRAPHY SCANNER THROUGHPUT
#20 | 2025-05-15EUV LIGHT SOURCE CONTAMINATION MONITORING SYSTEM
#21 | 2025-04-17SYSTEMS FOR MANUFACTURING SEMICONDUCTOR DEVICES
#22 | 2025-04-17METHOD AND SYSTEM TO FOR RAPID INSPECTION OF PHOTOLITHOGRAPHY RETICLE
#23 | 2025-03-27APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET RADIATION
#24 | 2025-03-27LITHOGRAPHY SYSTEM WITH FUEL CELL AND METHODS
#25 | 2025-03-06NEW DESIGN OF EUV VESSEL PERIMETER FLOW AUTO ADJUSTMENT
#26 | 2024-11-21LITHOGRAPHY THERMAL CONTROL
#27 | 2024-11-14SYSTEM AND METHOD FOR DETECTING DEBRIS IN A PHOTOLITHOGRAPHY SYSTEM
#28 | 2024-11-14SYSTEM AND METHOD FOR MONITORING AND CONTROLLING EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY PROCESSES
#29 | 2024-11-07SYSTEM AND METHOD FOR OMNIDIRECTIONAL REAL TIME DETECTION OF PHOTOLITHOGRAPHY CHARACTERISTICS
#30 | 2024-10-31DROPLET GENERATOR ASSEMBLY AND METHOD OF REPLACING COMPONENTS
#31 | 2024-10-31DROPLET GENERATOR ASSEMBLY AND METHOD OF REPLACING COMPONENTS
#32 | 2024-10-31LITHOGRAPHY CONTAMINATION CONTROL
#33 | 2024-10-31PARTICLE IMAGE VELOCIMETRY OF EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEMS
#34 | 2024-10-24EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM
#35 | 2024-10-17METHODS OF SERVICING PHOTOLITHOGRAPHIC APPARATUS
#36 | 2024-10-17EUV light source contamination monitoring system
#37 | 2024-09-12METHODS OF CLEANING A LITHOGRAPHY SYSTEM
#38 | 2024-09-05METHODS AND SYSTEMS FOR ALIGNING MASTER OSCILLATOR POWER AMPLIFIER SYSTEMS
#39 | 2024-09-05Lithography Apparatus and Method
#40 | 2024-06-27Method of cleaning wafer table of photolithography system and method of manufacturing integrated circuit
#41 | 2024-05-02SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
#42 | 2024-03-28EUV Lithography System With 3D Sensing and Tunning Modules
#43 | 2024-03-14TARGET CONTROL IN EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEMS USING ABERRATION OF REFLECTION IMAGE
#44 | 2024-02-15ONSITE CLEANING SYSTEM AND METHOD
#45 | 2024-02-08RETICLE COVERING PELLICLE FOR PHOTOLITHOGRPHY SCANNER
#46 | 2024-01-18Semiconductor processing tool and methods of operation
#47 | 2024-01-04APPARATUSES AND METHODS FOR REDUCING PARTICLE CONTAMINATION OF WAFERS DURING TRANSFER
#48 | 2024-01-04RADIATION COLLECTOR
#49 | 2023-12-14LITHOGRAPHY SYSTEM AND METHOD THEREOF
#50 | 2023-12-14LITHOGRAPHY SYSTEM AND METHODS
#51 | 2023-11-30EUV light source and apparatus for lithography
#52 | 2023-11-30Semiconductor processing method and apparatus
#53 | 2023-11-30Semiconductor processing tool and methods of operation
#54 | 2023-11-30EUV Lithography Mask With A Porous Reflective Multilayer Structure
#55 | 2023-11-23Shock wave visualization for extreme ultraviolet plasma optimization
#56 | 2023-11-23METHOD AND APPARATUS FOR REMOVING CONTAMINATION
#57 | 2023-11-23EUV wafer defect improvement and method of collecting nonconductive particles
#58 | 2023-11-23Device and method to remove debris from an extreme ultraviolet (EUV) lithography system
#59 | 2023-11-23Methods of cleaning a lithography system
#60 | 2023-11-23Semiconductor processing tool and methods of operation
#61 | 2023-11-23SYSTEM AND METHOD FOR DETECTING DEBRIS IN A PHOTOLITHOGRAPHY SYSTEM
#62 | 2023-11-23LITHOGRAPHY SYSTEM AND METHODS
#63 | 2023-11-23EUV photolithography system fuel source and methods of operating the same
#64 | 2023-11-16System and method for performing extreme ultraviolet photolithography processes
#65 | 2023-11-09Apparatus and method for generating extreme ultraviolet radiation
#66 | 2023-11-09Substrate stage and substrate processing system using the same
#67 | 2023-11-09EUV vessel perimeter flow auto adjustment
#68 | 2023-10-12Method for performing lithography process, light source, and EUV lithography system
#69 | 2023-09-28SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
#70 | 2023-09-28Method of lithography process and transferring a reticle
#71 | 2023-09-21System and method for detecting debris in a photolithography system
#72 | 2023-09-21Particle image velocimetry of extreme ultraviolet lithography systems
#73 | 2023-09-14System and method for dynamically controlling temperature of thermostatic reticles
#74 | 2023-09-07Lithography thermal control
#75 | 2023-09-07Reticle carrier and associated methods
#76 | 2023-09-07EUV lithography system with 3D sensing and tunning modules
#77 | 2023-08-31Radiation source apparatus and method for using the same
#78 | 2023-08-31Lithography contamination control
#79 | 2023-08-31Plasma position control for extreme ultraviolet lithography light sources
#80 | 2023-08-31Method and apparatus for mitigating contamination
#81 | 2023-08-24Reticle cleaning device and method of use
#82 | 2023-07-06EUV lithography apparatus
#83 | 2023-07-04System and method for dynamically controlling temperature of thermostatic reticles
#84 | 2023-06-29Methods and systems for aligning master oscillator power amplifier systems
#85 | 2023-06-15Method and system for generating droplets for EUV photolithography processes
#86 | 2023-05-25Method for using radiation source apparatus
#87 | 2023-05-18Method for lithography in semiconductor fabrication
#88 | 2023-05-11INSPECTION SYSTEM FOR EXTREME ULTRAVIOLET (EUV) LIGHT SOURCE
#89 | 2023-04-27Lithography apparatus and method
#90 | 2023-04-06Replacement and refill method for droplet generator
#91 | 2023-03-30Highly efficient automatic particle cleaner method for EUV systems
#92 | 2023-03-02Inspection tool for an extreme ultraviolet radiation source to observe tin residual
#93 | 2023-03-02Lithography thermal control
#94 | 2023-03-02Method and apparatus for mitigating contamination
#95 | 2023-03-02Reticle carrier and associated methods
#96 | 2023-03-02Method and apparatus for mitigating contamination
#97 | 2023-03-02EUV lithography apparatus
#98 | 2023-03-02EUV vessel perimeter flow auto adjustment
#99 | 2023-03-02Lithography contamination control
#100 | 2023-03-02System and method of discharging an EUV mask
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