Newtown, Connecticut
United States
54
2026-06-11
The entities that hold a legal rights for patent applications filed by inventor Cameron Thomas M.:
Thomas M. Cameron from Newtown, US has applied for patents for these inventions. The list has both pending applications and granted patents:
BISMUTH FILMS TARGETING EUV PHOTOLITHOGRAPHY APPLICATIONS
#2 | 2026-06-11BISMUTH PRECURSORS FOR EUV FILM PROCESSES
#3 | 2026-04-30ORGANOTIN PRECURSOR COMPOUNDS
#4 | 2026-03-19PROCESS FOR PREPARING ORGANOTIN COMPOUNDS
#5 | 2026-02-05METHOD OF PREPARING IODOSILANES AND COMPOSITIONS THEREFROM
#6 | 2025-08-28ALUMINUM-CONTAINING INHIBITOR COMPOUNDS FOR SELECTIVE DEPOSITION
#7 | 2025-07-31PROCESS FOR PREPARING ORGANOTIN COMPOUNDS
#8 | 2025-03-06PRECURSORS FOR SELECTIVE DEPOSITION OF SILICON-CONTAINING FILMS
#9 | 2025-01-02PROCESS FOR PREPARING ORGANOTIN COMPOUNDS
#10 | 2024-10-24MULTI-NUCLEAR TIN COMPOUNDS AND RELATED METHODS
#11 | 2024-10-17METHOD OF PREPARING IODOSILANES AND COMPOSITIONS THEREFROM
#12 | 2024-09-26MONO-SUBSTITUTED TIN COMPOUNDS AND RELATED METHODS
#13 | 2024-05-30FUNCTIONALIZED ORGANOTIN PRECURSORS AND RELATED METHODS
#14 | 2024-04-11TUNGSTEN PRECURSORS AND RELATED METHODS
#15 | 2024-04-11COMPOUNDS AND METHODS FOR PREPARATION OF ALUMINATES
#16 | 2024-03-28INDENYL PRECURSORS
#17 | 2024-03-21PRECURSORS CONTAINING FLUORINATED ALKOXIDES AND AMIDES
#18 | 2024-03-21COMPOSITIONS FOR EXTREME ULTRAVIOLET LITHOGRAPHY AND RELATED METHODS
#19 | 2024-01-04COMPOUNDS AND PROCESSES FOR EXTREME ULTRAVIOLET LITHOGRAPHY
#20 | 2023-12-07SAFETY RELIEF PLUG WITH A FUSIBLE METAL AND RELATED DEVICES AND METHODS
#21 | 2023-12-07COMPOSITIONS AND RELATED METHODS OF ALKYLTINTRIHALIDES
#22 | 2023-09-28PROCESS FOR PREPARING ORGANOTIN COMPOUNDS
#23 | 2023-08-31ORGANOMETALLIC PRECURSORS AND RELATED METHODS
#24 | 2023-08-03PROCESS FOR SELECTIVELY DEPOSITING HIGHLY-CONDUCTIVE METAL FILMS
#25 | 2023-05-25Organotin precursor compounds
#26 | 2022-12-22PROCESS FOR PREPARING ORGANOTIN COMPOUNDS
#27 | 2022-08-04Process for preparing organotin compounds
#28 | 2022-05-19Process for preparing organotin compounds
#29 | 2022-01-06Process for preparing organotin compounds
#30 | 2021-10-28METHOD OF PREPARING IODOSILANES AND COMPOSITIONS THEREFROM
#31 | 2020-06-11Preparation of triiodosilanes
#32 | 2016-12-15Cyclopentadienyl titanium alkoxides with ozone activated ligands for ALD of TiO2
#33 | 2016-11-24DOPING OF ZrO2 FOR DRAM APPLICATIONS
#34 | 2016-09-22Dopant precursors for mono-layer doping
#35 | 2015-05-28Silylene compositions and methods of use thereof
#36 | 2014-10-02Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films
#37 | 2013-09-26STRONTIUM AND BARIUM PRECURSORS FOR USE IN CHEMICAL VAPOR DEPOSITION, ATOMIC LAYER DEPOSITION AND RAPID VAPOR DEPOSITION
#38 | 2013-05-16Doping of ZrOfor DRAM applications
#39 | 2012-08-02ZIRCONIUM, HAFNIUM AND TITANIUM PRECURSORS FOR ATOMIC LAYER DEPOSITION OF CORRESPONDING METAL-CONTAINING FILMS
#40 | 2012-06-07Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films
#41 | 2012-05-24DOPED ZrO2 CAPACITOR MATERIALS AND STRUCTURES
#42 | 2012-03-15Method and composition for depositing ruthenium with assistive metal species
#43 | 2011-03-10METAL AMINOTROPONIMINATES, BIS-OXAZOLINATES AND GUANIDINATES
#44 | 2010-11-18Strontium precursor for use in chemical vapor deposition, atomic layer deposition and rapid vapor deposition
#45 | 2010-11-04NOVEL BISMUTH PRECURSORS FOR CVD/ALD OF THIN FILMS
#46 | 2010-10-28ZIRCONIUM PRECURSORS USEFUL IN ATOMIC LAYER DEPOSITION OF ZIRCONIUM-CONTAINING FILMS
#47 | 2010-08-19GROUP IV COMPLEXES AS CVD AND ALD PRECURSORS FOR FORMING METAL-CONTAINING THIN FILMS
#48 | 2010-08-19In situ generation of RuO4 for ALD of Ru and Ru related materials
#49 | 2010-05-06ZIRCONIUM, HAFNIUM, TITANIUM, AND SILICON PRECURSORS FOR ALD/CVD
#50 | 2010-04-22Precursor compositions for ALD/CVD of group II ruthenate thin films
#51 | 2010-03-11Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films
#52 | 2010-01-28Precursors for CVD/ALD of metal-containing films
#53 | 2009-06-25COPPER (I) AMIDINATES AND GUANIDINATES, MIXED LIGAND COPPER COMPLEXES, AND COMPOSITIONS FOR CHEMICAL VAPOR DEPOSITION, ATOMIC LAYER DEPOSITION, AND RAPID VAPOR DEPOSITION OF COPPER
#54 | 2009-03-19Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films
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