Albany, New York
United States
20
2026-04-02
The entities that hold a legal rights for patent applications filed by inventor Wang Junli:
Junli Wang from Albany, US has applied for patents for these inventions. The list has both pending applications and granted patents:
DISCONTINUOUS HIGH DIELECTRIC CONSTANT (HK) LAYER
#2 | 2020-02-27Integration of input/output device in vertical field-effect transistor technology
#3 | 2020-02-27Integrating a junction field effect transistor into a vertical field effect transistor
#4 | 2020-01-09Integration of input/output device in vertical field-effect transistor technology
#5 | 2020-01-02Method for forming strained fin channel devices
#6 | 2019-12-10Integrating a junction field effect transistor into a vertical field effect transistor
#7 | 2019-11-05Low resistance contact for transistors
#8 | 2019-09-19Vertical transport static random-access memory cells with transistors of active regions arranged in linear rows
#9 | 2019-09-10Strained fin channel devices
#10 | 2019-06-27Integration of input/output device in vertical field-effect transistor technology
#11 | 2019-06-13Vertical FET with shaped spacer to reduce parasitic capacitance
#12 | 2019-06-13VFET metal gate patterning for vertical transport field effect transistor
#13 | 2019-05-02Electrostatic discharge protection using vertical fin CMOS technology
#14 | 2019-04-18Precision beol resistors
#15 | 2019-04-18Precision BEOL resistors
#16 | 2019-04-18Precision BEOL resistors
#17 | 2019-04-18Precision BEOL resistors
#18 | 2019-03-19VFET metal gate patterning for vertical transport field effect transistor
#19 | 2018-07-10Integration of super via structure in BEOL
#20 | 2018-07-10Integration of super via structure in BEOL
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