Hsinchu
Taiwan
34
2026-05-14
The entities that hold a legal rights for patent applications filed by inventor Wang Peng:
Peng Wang from Hsinchu, TW has applied for patents for these inventions. The list has both pending applications and granted patents:
METAL GATE STRUCTURE CUTTING PROCESS
#2 | 2026-05-14TRANSISTOR DEVICE WITH TAPERED GATE CONTACT PROFILE
#3 | 2025-11-27INTEGRATED CIRCUIT STRUCTURE AND MANUFACTURING METHOD THEREOF
#4 | 2025-11-27INTEGRATED CIRCUIT STRUCTURE AND MANUFACTURING METHOD THEREOF
#5 | 2025-11-20ETCH PROFILE CONTROL OF VIA OPENING
#6 | 2024-11-14EPITAXIAL SOURCE/DRAIN STRUCTURE AND METHOD
#7 | 2024-10-31Asymmetric Source and Drain Structures in Semiconductor Devices
#8 | 2024-10-31SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURE
#9 | 2024-10-03DEVICE WITH CONTROLLED GATE CONTACT PROFILE
#10 | 2024-08-08INTEGRATED CIRCUIT STRUCTURE AND MANUFACTURING METHOD THEREOF
#11 | 2024-03-07SEMICONDUCTOR DEVICE STRUCTURE WITH CONDUCTIVE VIA STRUCTURE
#12 | 2024-01-25ETCH PROFILE CONTROL OF VIA OPENING
#13 | 2023-11-23Epitaxial source/drain structure and method
#14 | 2023-11-02METAL GATE STRUCTURE CUTTING PROCESS
#15 | 2023-10-19INTEGRATED CIRCUIT STRUCTURE AND MANUFACTURING METHOD THEREOF
#16 | 2023-10-12ETCH PROFILE CONTROL OF GATE CONTACT OPENING
#17 | 2023-06-15Etch profile control of gate contact opening
#18 | 2023-02-16Semiconductor devices and methods of manufacture
#19 | 2022-12-22Semiconductor device structure with conductive via structure and method for forming the same
#20 | 2022-04-28Epitaxial source/drain structure and method
#21 | 2022-03-31Etch profile control of gate contact opening
#22 | 2022-03-31Etch profile control of via opening
#23 | 2022-03-31Integrated circuit structure and manufacturing method thereof
#24 | 2022-03-31Integrated circuit structure and manufacturing method thereof
#25 | 2022-03-31Etch profile control of gate contact opening
#26 | 2021-09-23Asymmetric source and drain structures in semiconductor devices
#27 | 2021-06-10Metal gate structure cutting process
#28 | 2020-06-11Selective NFET/PFET recess of source/drain regions
#29 | 2020-04-30Method for shrinking openings in forming integrated circuits
#30 | 2020-03-05Epitaxial source/drain structure and method
#31 | 2020-03-05Metal gate structure cutting process
#32 | 2020-01-02Asymmetric source and drain structures in semiconductor devices
#33 | 2019-10-31Selective NFET/PFET recess of source/drain regions
#34 | 2019-05-30Asymmetric source and drain structures in semiconductor devices
2517753 ⎘