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Inventor profile of:

Dongyang Peng

City:

Beijing

Country:

China

Published Applications:

1

Last publication date:

2019-06-20

Recent patent applications by Peng Dongyang

Dongyang Peng from Beijing, CN has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2019-06-20

US20190185715A1

Chemistry; metallurgy

POLISHING LIQUID FOR CMP AND PREPARATION METHOD AND USE THEREOF

InventorID:

2534465 ⎘