Albany, New York
United States
4
2020-02-13
The entities that hold a legal rights for patent applications filed by inventor Ebrish Mona:
Mona Ebrish from Albany, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Nanosheet substrate to source/drain isolation
#2 | 2019-09-26Two step fin etch and reveal for VTFETs and high breakdown LDVTFETs
#3 | 2019-08-22High temperature ultra-fast annealed soft mask for semiconductor devices
#4 | 2019-07-04Vertical transport FET with two or more gate lengths
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