David Hwang

City:

Windermere, Florida

Country:

United States

Published Applications:

Last publication date:

2024-05-02

Top Assignees for applications by David Hwang

The entities that hold a legal rights for patent applications filed by inventor Hwang David:

David Hwang from Windermere, US has applied for patents for these inventions. The list has both pending applications and granted patents:

METHOD TO IMPROVE PERFORMANCES OF TUNNEL JUNCTIONS GROWN BY METAL ORGANIC CHEMICAL VAPOR DEPOSITION

Reduction of surface recombination losses in micro-LEDs

REDUCTION IN LEAKAGE CURRENT AND INCREASE IN EFFICIENCY OF III-NITRIDE LEDS BY SIDEWALL PASSIVATION USING ATOMIC LAYER DEPOSITION

Methods for fabricating III-nitride tunnel junction devices

InventorID:

2551947 ⎘