Inventor profile of:

David KUIPER

City:

Brookfield, Connecticut

Country:

United States

Published Applications:

25

Last publication date:

2026-06-04

Top Assignees for applications by David KUIPER

The entities that hold a legal rights for patent applications filed by inventor KUIPER David:

Recent patent applications by KUIPER David

David KUIPER from Brookfield, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2026-06-04
US20260152517A1
Chemistry; metallurgy

HIGH PURITY PRECURSOR COMPOSITIONS AND RELATED METHODS

#2 | 2026-04-30
US20260117370A1
Chemistry; metallurgy

ORGANOTIN PRECURSOR COMPOUNDS

#3 | 2026-02-05
US20260035252A1
Chemistry; metallurgy

METHOD OF PREPARING IODOSILANES AND COMPOSITIONS THEREFROM

#4 | 2025-12-18
US20250382319A1
Chemistry; metallurgy

ONE STEP SYNTHESIS OF HIGH PURITY PRECURSORS

#5 | 2025-11-27
US20250361254A1
Chemistry; metallurgy

HIGH PURITY BIS (ARENE) METAL COMPLEXES

#6 | 2025-07-31
US20250243226A1
Chemistry; metallurgy

PROCESS FOR PREPARING ORGANOTIN COMPOUNDS

#7 | 2024-10-17
US20240343591A1
Chemistry; metallurgy

METHOD OF PREPARING IODOSILANES AND COMPOSITIONS THEREFROM

#8 | 2024-04-04
US20240109927A1
Chemistry; metallurgy

BIS (ARENE) METAL COMPLEXES AND RELATED METHODS

#9 | 2023-09-21
US20230295196A1
Chemistry; metallurgy

PROCESS FOR PREPARING ORGANOTIN COMPOUNDS

#10 | 2023-08-31
US20230271987A1
Chemistry; metallurgy

ORGANOMETALLIC PRECURSORS AND RELATED METHODS

#11 | 2023-05-25
US20230160058A1
Chemistry; metallurgy

Organotin precursor compounds

#12 | 2023-03-30
US20230098280A1
Chemistry; metallurgy

Synthesis of fluoroalkyl tin precursors

#13 | 2023-02-09
US20230041086A1
Chemistry; metallurgy

Vapor deposition precursor compounds and process of use

#14 | 2022-10-20
US20220333012A1
Chemistry; metallurgy

Formulations for high selective silicon nitride etch

#15 | 2022-08-04
US20220242888A1
Chemistry; metallurgy

Process for preparing organotin compounds

#16 | 2022-07-28
US20220238330A1
Electricity

HIGH THROUGHPUT DEPOSITION PROCESS

#17 | 2022-05-19
US20220153763A1
Chemistry; metallurgy

Process for preparing organotin compounds

#18 | 2022-01-06
US20220002323A1
Chemistry; metallurgy

Process for preparing organotin compounds

#19 | 2021-12-16
US20210388008A1
Chemistry; metallurgy

Vapor deposition precursor compounds and process of use

#20 | 2021-10-28
US20210331930A1
Chemistry; metallurgy

METHOD OF PREPARING IODOSILANES AND COMPOSITIONS THEREFROM

#21 | 2021-04-08
US20210101917A1
Chemistry; metallurgy

Triiodosilylamine precursor compounds

#22 | 2021-02-25
US20210054287A1
Chemistry; metallurgy

Formulations for high selective silicon nitride etch

#23 | 2020-07-23
US20200231616A1
Chemistry; metallurgy

Aminoiodosilanes and methods of synthesizing these aminoiodosilanes

#24 | 2020-06-11
US20200181178A1
Chemistry; metallurgy

Preparation of triiodosilanes

#25 | 2019-07-18
US20190218238A1
Chemistry; metallurgy

Aminoiodosilanes and methods of synthesizing these aminoiodosilanes

InventorID:

2560842 ⎘