Hudson, Massachusetts
United States
81
2024-05-09
The entities that hold a legal rights for patent applications filed by inventor Wang Deyan:
Deyan Wang from Hudson, US has applied for patents for these inventions. The list has both pending applications and granted patents:
HIGH REFRACTIVE INDEX MATERIALS
#2 | 2023-04-20UV-curing resin compositions for hard coat applications
#3 | 2022-07-07PHOTORESIST TOPCOAT COMPOSITIONS AND PATTERN FORMATION METHODS
#4 | 2022-07-07PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS
#5 | 2022-04-14HIGH REFRACTIVE INDEX MATERIALS
#6 | 2021-11-04Coating compositions and methods of forming electronic devices
#7 | 2021-09-09Optically clear shear thickening fluids and optical display device comprising same
#8 | 2021-01-21Polymers for display devices
#9 | 2020-08-20Anti-reflective coating
#10 | 2019-08-01Photoresist topcoat compositions and methods of processing photoresist compositions
#11 | 2019-07-18Acoustic wave sensors and methods of sensing a gas-phase analyte
#12 | 2018-10-04A METHOD OF MAKING A MULTILAYER STRUCTURE
#13 | 2018-10-04METHOD OF FORMING A MULTILAYER STRUCTURE
#14 | 2018-09-27A METHOD OF MAKING A GRAPHITIC CARBON SHEET
#15 | 2018-09-20A METHOD OF MAKING A COMPOSITE MULTILAYER STRUCTURE
#16 | 2018-08-09COMPOSITIONS AND METHODS FOR FORMING A PIXEL-DEFINING LAYER
#17 | 2018-05-03Photoresist topcoat compositions and methods of processing photoresist compositions
#18 | 2018-05-03Topcoat compositions and pattern-forming methods
#19 | 2017-11-16Neutral layer polymers, methods of manufacture thereof and articles comprising the same
#20 | 2016-11-17PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORESIST COMPOSITIONS
#21 | 2016-05-12Display device manufacture using a sacrificial layer interposed between a carrier and a display device substrate
#22 | 2016-05-12TOPCOAT COMPOSITIONS AND PHOTOLITHOGRAPHIC METHODS
#23 | 2016-04-21Photoresist compositions and methods of forming photolithographic patterns
#24 | 2016-03-10Compositions comprising sulfonamide material and processes for photolithography
#25 | 2016-03-03Polyarylene materials
#26 | 2016-02-18Hardmask
#27 | 2015-12-31COMPOSITIONS COMPRISING CARBOXY COMPONENT AND PROCESSES FOR PHOTOLITHOGRAPHY
#28 | 2015-11-12Topcoat compositions and photolithographic methods
#29 | 2015-10-15Metal hardmask compositions
#30 | 2015-03-05Hardmask
#31 | 2015-02-12Compositions and processes for immersion lithography
#32 | 2015-01-22Organoaluminum materials for forming aluminum oxide layer from coating composition that contains organic solvent
#33 | 2015-01-22ORGANOMETAL MATERIALS AND PROCESS
#34 | 2014-12-25Neutral layer polymers, methods of manufacture thereof and articles comprising the same
#35 | 2014-12-25Orientation control layer formed on a free top surface of a first block copolymer from a mixture of first and second block copolymers
#36 | 2014-12-25NEUTRAL LAYER POLYMERS, METHODS OF MANUFACTURE THEREOF AND ARTICLES COMPRISING THE SAME
#37 | 2014-10-30Compositions and processes for immersion lithography
#38 | 2014-10-02Compositions and processes for photolithography
#39 | 2014-07-24Hardmask surface treatment
#40 | 2014-07-24Hardmask surface treatment
#41 | 2014-06-26Methods and compositions for removal of metal hardmasks
#42 | 2014-03-27Hardmask
#43 | 2014-03-06Photoresist and coated substrate comprising same
#44 | 2014-02-06Photoresist compositions and methods of forming photolithographic patterns
#45 | 2013-12-19Metal hardmask compositions
#46 | 2013-05-30Surface active additive and photoresist composition comprising same
#47 | 2013-05-09Topcoat compositions and photolithographic methods
#48 | 2013-03-14Compositions and processes for immersion lithography
#49 | 2013-01-17Compositions and processes for photolithography
#50 | 2013-01-03Leveler compounds
#51 | 2012-10-18Compositions and processes for photolithography
#52 | 2012-09-06Compositions and processes for photolithography
#53 | 2012-07-05Compositions comprising base-reactive component and processes for photolithography
#54 | 2012-06-21COMPOSITIONS COMPRISING SUGAR COMPONENT AND PROCESSES FOR PHOTOLITHOGRAPHY
#55 | 2012-05-24Base reactive photoacid generators and photoresists comprising same
#56 | 2012-05-17Compositions comprising base-reactive component and processes for photolithography
#57 | 2011-12-01Photoresist compositions and methods of forming photolithographic patterns
#58 | 2011-10-20Compositions and processes for immersion lithography
#59 | 2011-10-20Compositions comprising base-reactive component and processes for photolithography
#60 | 2011-06-16Coating compositions for photoresists
#61 | 2011-01-06Processes for photolithography
#62 | 2010-12-02Compositions and processes for photolithography
#63 | 2010-11-25Compositions comprising sulfonamide material and processes for photolithography
#64 | 2010-11-25Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithography
#65 | 2010-07-22Compositions and processes for photolithography
#66 | 2010-07-22Compositions and processes for photolithography
#67 | 2010-07-08Compositions comprising carboxy component and processes for photolithography
#68 | 2009-09-17Compositions and processes for photolithography
#69 | 2009-06-04Leveler compounds
#70 | 2009-05-21Compositions and processes for immersion lithography
#71 | 2009-05-14Compositions and processes for immersion lithography
#72 | 2009-05-07Compositons and processes for immersion lithography
#73 | 2008-08-14Compositions and processes for immersion lithography
#74 | 2007-09-13Compositions and processes for photolithography
#75 | 2007-07-12Coating compositions for photoresists
#76 | 2007-04-19Compositions and processes for photolithography
#77 | 2007-04-19Leveler compounds
#78 | 2006-11-02Compositions and processes for immersion lithography
#79 | 2006-10-31Leveler compounds
#80 | 2006-01-26Leveler compounds
#81 | 2005-01-27Plating method
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