Boise, Idaho
United States
6
2013-05-30
The entities that hold a legal rights for patent applications filed by inventor Stanton William:
William Stanton from Boise, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Photomask constructions having liners of specified compositions along sidewalls of multi-layered structures
#2 | 2011-07-07Photomask constructions having liners of specified compositions along sidewalls of multi-layered structures
#3 | 2010-09-30Methods of forming and using reticles
#4 | 2009-07-23Methods of forming photomasks
#5 | 2008-12-18Photomasks Used to Fabricate Integrated Circuitry, Finished-Construction Binary Photomasks Used to Fabricate Integrated Circuitry, Methods of Forming Photomasks, and Methods of Photolithographically Patterning Substrates
#6 | 2008-11-20Methods of forming and using reticles
2597472 ⎘