Inventor profile of:

Kana Okada

City:

Kanagawa

Country:

Japan

Published Applications:

8

Last publication date:

2024-12-05

Top Assignees for applications by Kana Okada

The entities that hold a legal rights for patent applications filed by inventor Okada Kana:

Recent patent applications by Okada Kana

Kana Okada from Kanagawa, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2024-12-05
US20240400751A1
Chemistry; metallurgy

EPOXY RESIN COMPOSITION, CURED PRODUCT THEREOF, FIBER-REINFORCED COMPOSITE MATERIAL, AND HIGH PRESSURE GAS CONTAINER

#2 | 2024-12-05
US20240400750A1
Chemistry; metallurgy

EPOXY RESIN COMPOSITION, CURED PRODUCT THEREOF, PREPREG, FIBER-REINFORCED COMPOSITE MATERIAL, AND HIGH-PRESSURE GAS CONTAINER

#3 | 2018-04-12
US20180101097A1
Physics

MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, COMPOSITION FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY AND PATTERN FORMING METHOD

#4 | 2018-04-12
US20180101096A1
Physics

Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and pattern forming method

#5 | 2018-03-08
US20180065930A1
Chemistry; metallurgy

Compound, resin, material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and method for purifying compound or resin

#6 | 2018-02-22
US20180052392A1
Physics

MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, COMPOSITION FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, RESIST PATTERN FORMING METHOD, AND CIRCUIT PATTERN FORMING METHOD

#7 | 2017-08-10
US20170227849A1
Physics

Composition for forming underlayer film for lithography, underlayer film for lithography and pattern forming method

#8 | 2013-05-23
US20130130062A1
Performing operations; transporting

Laminate film

InventorID:

261663 ⎘