Tokyo
Japan
20
2025-05-08
The entities that hold a legal rights for patent applications filed by inventor KOJIMA Yosuke:
Yosuke KOJIMA from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
PHASE SHIFT MASK AND METHOD FOR MANUFACTURING PHASE SHIFT MASK
#2 | 2025-04-24PHOTOMASK BLANK, PHOTOMASK, AND METHOD FOR MANUFACTURING PHOTOMASK
#3 | 2024-12-19PHASE SHIFT MASK AND METHOD FOR MANUFACTURING PHASE SHIFT MASK
#4 | 2024-09-12PHASE SHIFT MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING PHASE SHIFT MASK
#5 | 2024-05-09PHASE SHIFT MASK BLANK, PHASE SHIFT MASK, METHOD FOR MANUFACTURING PHASE SHIFT MASK, AND METHOD FOR MODIFYING PHASE SHIFT MASK
#6 | 2023-10-19PHASE SHIFT MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING PHASE SHIFT MASK
#7 | 2023-03-09REFLECTIVE MASK BLANK, REFLECTIVE MASK, REFLECTIVE MASK MANUFACTURING METHOD, AND REFLECTIVE MASK CORRECTION METHOD
#8 | 2021-09-23INFORMATION PROCESSING SYSTEM, INFORMATION PROCESSING METHOD, AND NON-TRANSITORY STORAGE MEDIUM
#9 | 2020-01-09Photomask blank, photomask, and photomask manufacturing method
#10 | 2013-05-23Light pattern exposure method, photomask, and photomask blank
#11 | 2013-05-23Light pattern exposure method, halftone phase shift mask, and halftone phase shift mask blank
#12 | 2012-10-04Photomask blank and method for manufacturing photomask
#13 | 2012-08-23Apparatus, a method and a program thereof
#14 | 2012-03-15Photomask blank and making method, photomask, light pattern exposure method, and design method of transition metal/silicon base material film
#15 | 2010-10-14Photomask blank and photomask
#16 | 2010-10-14Photomask blank and photomask
#17 | 2010-10-14Photomask blank and photomask making method
#18 | 2007-11-22Phase-shift mask, manufacturing method thereof and manufacturing method of semiconductor element
#19 | 2007-09-13Photomask blank and photomask making method
#20 | 2007-09-13Photomask blank and photomask
261883 ⎘