Rolla, Missouri
United States
11
2026-05-28
The entities that hold a legal rights for patent applications filed by inventor Wang Yubao:
Yubao Wang from Rolla, US has applied for patents for these inventions. The list has both pending applications and granted patents:
ORGANIC UNDERLAYER AND METHODS FOR EUV DOSE REDUCTION
#2 | 2021-04-29High-silicon-content wet-removable planarizing layer
#3 | 2021-02-25Underlayers for EUV lithography
#4 | 2014-12-04Spin-on carbon compositions for lithographic processing
#5 | 2014-08-14ON-TRACK REVERSE LITHOGRAPHY TO THIN MASK FOR FABRICATION OF DARK-FIELD FEATURES
#6 | 2013-10-17Silicon hardmask layer for directed self-assembly
#7 | 2013-04-11Spin-on carbon compositions for lithographic processing
#8 | 2013-01-10Metal-oxide films from small molecules for lithographic applications
#9 | 2012-10-18Method of making radiation-sensitive sol-gel materials
#10 | 2012-06-28Processes to pattern small features for advanced patterning needs
#11 | 2006-02-09Hybrid organic-inorganic polymer coatings with high refractive indices
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