Bear, Delaware
United States
9
2025-03-20
The entities that hold a legal rights for patent applications filed by inventor GUO Xiangyu:
Xiangyu GUO from Bear, US has applied for patents for these inventions. The list has both pending applications and granted patents:
DEPOSITION OF IODINE-CONTAINING CARBON FILMS
#2 | 2025-02-06HIGH CONDUCTIVE PASSIVATION LAYERS AND METHOD OF FORMING THE SAME DURING HIGH ASPECT RATIO PLASMA ETCHING
#3 | 2024-07-18NITROGEN-CONTAINING AROMATIC OR RING STRUCTURE MOLECULES FOR PLASMA ETCH AND DEPOSITION
#4 | 2024-05-16ETCHING METHODS WITH ALTERNATING NON-PLASMA AND PLASMA ETCHING PROCESSES
#5 | 2023-06-22Deposition of iodine-containing carbon films
#6 | 2023-01-26Method to improve profile control during selective etching of silicon nitride spacers
#7 | 2022-07-14High conductive passivation layers and method of forming the same during high aspect ratio plasma etching
#8 | 2020-08-06Method to improve profile control during selective etching of silicon nitride spacers
#9 | 2020-04-21Method to improve profile control during selective etching of silicon nitride spacers
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