Corvallis, Oregon
United States
53
2026-04-23
The entities that hold a legal rights for patent applications filed by inventor JIANG Kai:
Kai JIANG from Corvallis, US has applied for patents for these inventions. The list has both pending applications and granted patents:
TIN DODECAMERS AND RADIATION PATTERNABLE COATINGS WITH STRONG EUV ABSORPTION
#2 | 2026-02-05ORGANOMETALLIC COMPOSITIONS WITH PHOSPHONATE ADDITIVES FOR EUV PATTERNING
#3 | 2025-12-18ALKYLSULFONIC ACID DEVELOPER COMPOSITIONS AND PATTERNING METHODS FOR ORGANOMETALLIC OXIDE PHOTORESISTS
#4 | 2025-11-06ORGANOMETALLIC PHOTORESIST DEVELOPER COMPOSITIONS AND PROCESSING METHODS
#5 | 2025-10-30PEROXIDE-STABILIZED ORGANOTIN PHOTORESIST COMPOSITIONS AND PATTERNING
#6 | 2025-08-14ORGANOTIN PATTERNING MATERIALS WITH LIGANDS HAVING SILICON/GERMANIUM; PRECURSOR COMPOSITIONS; AND SYNTHESIS METHODS
#7 | 2025-08-07RADICAL SCAVENGER ADDITIVES FOR METAL OXIDE BASED RESISTS AND PRECURSOR SOLUTIONS
#8 | 2025-07-10ORGANOTIN OXIDE HYDROXIDE PATTERNING COMPOSITIONS, PRECURSORS, AND PATTERNING
#9 | 2025-03-20ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS
#10 | 2025-03-13ORGANOTIN PHOTORESIST COMPOSITIONS HAVING FLUORIDE GENERATOR COMPOUNDS, FLUORINATED ORGANOTIN COATINGS AND PATTERNING
#11 | 2025-03-06ORGANOTIN COMPOSITIONS HAVING LIGANDS WITH ACETAL FUNCTIONAL GROUPS, PATTERNING COMPOSITIONS WITH ORGANOTIN BLENDS AND POSITIVE TONE PATTERNING
#12 | 2025-01-09ORGANOTIN CLUSTERS, SOLUTIONS OF ORGANOTIN CLUSTERS, AND APPLICATION TO HIGH RESOLUTION PATTERNING
#13 | 2024-12-26STABLE SOLUTIONS OF MONOALKYL TIN ALKOXIDES AND THEIR HYDROLYSIS AND CONDENSATION PRODUCTS
#14 | 2024-11-14TIN DODECAMERS AND RADIATION PATTERNABLE COATINGS WITH STRONG EUV ABSORPTION
#15 | 2024-10-10Organotin patterning materials with ligands having silicon/germanium; precursor compositions; and synthesis methods
#16 | 2024-10-10ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS AND CORRESPONDING METHODS
#17 | 2024-08-22ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS AND CORRESPONDING METHODS
#18 | 2024-03-21Stable solutions of monoalkyl tin alkoxides and their hydrolysis and condensation products
#19 | 2024-03-14ADDITIVES FOR METAL OXIDE PHOTORESISTS, POSITIVE TONE DEVELOPMENT WITH ADDITIVES, AND DOUBLE BAKE DOUBLE DEVELOP PROCESSING
#20 | 2023-05-11STABILITY-ENHANCED ORGANOTIN PHOTORESIST COMPOSITIONS
#21 | 2023-01-05ORGANOTIN OXIDE HYDROXIDE PATTERNING COMPOSITIONS, PRECURSORS, AND PATTERNING
#22 | 2023-01-05Organometallic solution based high resolution patterning compositions
#23 | 2023-01-05Organometallic solution based high resolution patterning compositions
#24 | 2023-01-05Organometallic solution based high resolution patterning compositions
#25 | 2022-12-15Organotin patterning materials with ligands having silicon/germanium; precursor compositions; and synthesis methods
#26 | 2022-11-17Organometallic solution based high resolution patterning compositions
#27 | 2022-10-20Organotin oxide hydroxide patterning compositions, precursors, and patterning
#28 | 2022-10-20Organotin oxide hydroxide patterning compositions, precursors, and patterning
#29 | 2022-10-13Tin dodecamers and radiation patternable coatings with strong EUV absorption
#30 | 2022-09-22Organotin oxide hydroxide patterning compositions, precursors, and patterning
#31 | 2022-09-15Organometallic solution based high resolution patterning compositions and corresponding methods
#32 | 2022-06-16Stable solutions of monoalkyl tin alkoxides and their hydrolysis and condensation products
#33 | 2022-01-27Apparatuses for reducing metal residue in edge bead region from metal-containing resists
#34 | 2021-11-11Organotin clusters, solutions of organotin clusters, and application to high resolution patterning
#35 | 2021-02-18Organometallic solution based high resolution patterning compositions and corresponding methods
#36 | 2020-11-26Organotin oxide hydroxide patterning compositions, precursors, and patterning
#37 | 2020-10-15ORGANOMETALLIC PHOTORESIST DEVELOPER COMPOSITIONS AND PROCESSING METHODS
#38 | 2020-08-13Organotin oxide hydroxide patterning compositions, precursors, and patterning
#39 | 2020-07-02Apparatuses for reducing metal residue in edge bead region from metal-containing resists
#40 | 2020-02-27Organometallic solution based high resolution patterning compositions and corresponding methods
#41 | 2019-12-26Stable solutions of monoalkyl tin alkoxides and their hydrolysis and condensation products
#42 | 2019-12-05Organometallic solution based high resolution patterning compositions
#43 | 2019-10-10Tin dodecamers and radiation patternable coatings with strong EUV absorption
#44 | 2019-05-23Organotin clusters, solutions of organotin clusters, and application to high resolution patterning
#45 | 2019-05-09Organotin oxide hydroxide patterning compositions, precursors, and patterning
#46 | 2018-10-25Organometallic solution based high resolution patterning compositions
#47 | 2018-02-15Methods of reducing metal residue in edge bead region from metal-containing resists
#48 | 2017-04-13Organotin oxide hydroxide patterning compositions, precursors, and patterning
#49 | 2016-07-28Organometallic solution based high resolution patterning compositions
#50 | 2016-04-28Organometallic solution based high resolution patterning compositions and corresponding methods
#51 | 2015-02-26Organometallic solution based high resolution patterning compositions
#52 | 2013-11-07PROCESSES TO FORM AQUEOUS PRECURSORS, HAFNIUM AND ZIRCONIUM OXIDE FILMS, AND HAFNIUM AND ZIRCONIUM OXIDE PATTERNS
#53 | 2013-06-13Array substrate including thin film transistor and method of fabricating the same
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