Inventor profile of:

Hieu Lam

City:

Milpitas, California

Country:

United States

Published Applications:

13

Last publication date:

2014-10-14

Top Assignees for applications by Hieu Lam

The entities that hold a legal rights for patent applications filed by inventor Lam Hieu:

Recent patent applications by Lam Hieu

Hieu Lam from Milpitas, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2014-10-14
US13905291
Physics

Perpendicular magnetic recording write head with main pole formed on a metallic amorphous underlayer

#2 | 2013-01-03
US20130001188A1
Electricity

METHOD TO PROTECT MAGNETIC BITS DURING PLANARIZATION

#3 | 2010-05-06
US20100107402A1
Physics

Methods of making magnetic write heads with use of a resist channel shrinking solution having corrosion inhibitors

#4 | 2009-07-02
US20090168260A1
Physics

Layered return poles for magnetic write heads

#5 | 2009-06-18
US20090152235A1
Physics

Method of manufacturing a perpendicular magnetic write head with stepped trailing magnetic shield with electrical lapping guide control

#6 | 2008-05-15
US20080113090A1
Physics

Use of anti-reflective seed layers for the fabrication of perpendicular thin film heads

#7 | 2008-05-15
US20080110761A1
Chemistry; metallurgy

Use of metal capped seed layers for the fabrication of perpendicular thin film heads

#8 | 2007-10-11
US20070236833A1
Physics

Method and apparatus for integrating a stair notch and a gap bump at a pole tip in a write head

#9 | 2007-06-07
US20070125656A1
Chemistry; metallurgy

Controlling the thickness of wafers during the electroplating process

#10 | 2007-03-15
US20070058293A1
Physics

Magnetic write head having a self aligned, steep shoulder pole structure and method of manufacture thereof

#11 | 2006-08-03
US20060171069A1
Physics

P1 write pole with shoulder formation

#12 | 2006-05-11
US20060096081A1
Physics

Methods of making magnetic write heads with use of a resist channel shrinking solution having corrosion inhibitors

#13 | 2005-11-17
US20050252780A1
Physics

Methods for improving positioning performance of electron beam lithography on magnetic wafers

InventorID:

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