Heiko Siekmann

City:

Aalen

Country:

Germany

Published Applications:

Last publication date:

2025-03-20

Top Assignees for applications by Heiko Siekmann

The entities that hold a legal rights for patent applications filed by inventor Siekmann Heiko:

Carl Zeiss SMT GmbH 7 Oberkochen, Germany
CARL ZEISS SMT AG 2 Oberkochen, Germany

Recent patent applications by Siekmann Heiko

Heiko Siekmann from Aalen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2025-03-20

US20250093557A1

Physics

METHOD FOR PRODUCING A SUBSTRATE FOR AN OPTICAL ELEMENT, AND REFLECTIVE OPTICAL ELEMENT

#2 | 2021-03-11

US20210072435A1

Physics

Method for producing a substrate for an optical element

#3 | 2016-03-17

US20160077446A1

Physics

Illumination system for a microlithographic projection exposure apparatus

#4 | 2013-12-19

US20130335816A1

Physics

Method for producing a reflective optical component for an EUV projection exposure apparatus and component of this type

#5 | 2013-07-04

US20130170056A1

Physics

Substrate for mirrors for EUV lithography

#6 | 2013-06-13

US20130148092A1

Physics

Illumination system for a microlithographic projection exposure apparatus

#7 | 2011-04-14

US20110083542A1

Physics

Optical integrator for an illumination system of a microlithographic projection exposure apparatus

#8 | 2009-01-22

US20090021839A1

Physics

Optical integrator for an illumination system of a microlithographic projection exposure apparatus

#9 | 2009-01-22

US20090021716A1

Physics

Illumination system for a microlithographic projection exposure apparatus

InventorID:

283618 ⎘