Inventor profile of:

Hitoshi MAEDA

City:

Tokyo

Country:

Japan

Published Applications:

24

Last publication date:

2024-10-10

Top Assignees for applications by Hitoshi MAEDA

The entities that hold a legal rights for patent applications filed by inventor MAEDA Hitoshi:

Recent patent applications by MAEDA Hitoshi

Hitoshi MAEDA from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2024-10-10
US20240337919A1
Physics

MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE

#2 | 2024-09-26
US20240319577A1
Physics

REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD OF MANUFACTURING REFLECTIVE MASK

#3 | 2024-07-11
US20240234528A9
Electricity

SEMICONDUCTOR DEVICE

#4 | 2024-06-06
US20240184194A1
Physics

MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE

#5 | 2024-04-25
US20240136419A1
Electricity

Semiconductor device

#6 | 2023-12-07
US20230393457A1
Physics

MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE

#7 | 2023-10-05
US20230314929A1
Physics

MASK BLANK, PHASE SHIFT MASK, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

#8 | 2023-05-11
US20230142180A1
Physics

MASK BLANK, TRANSFER MASK, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

#9 | 2023-03-02
US20230069092A1
Physics

MASK BLANK AND METHOD OF MANUFACTURING PHOTOMASK

#10 | 2022-10-27
US20220342294A1
Physics

MASK BLANK, PHASE SHIFT MASK, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

#11 | 2022-08-11
US20220252972A1
Physics

MASK BLANK, PHASE SHIFT MASK AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE

#12 | 2022-04-28
US20220128898A1
Physics

Mask blank, phase shift mask, and method of manufacturing semiconductor device

#13 | 2022-04-21
US20220121104A1
Physics

MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

#14 | 2022-03-03
US20220068706A1
Electricity

Method of manufacturing semiconductor device

#15 | 2022-02-10
US20220043335A1
Physics

MASK BLANK, TRANSFER MASK, AND SEMICONDUCTOR-DEVICE MANUFACTURING METHOD

#16 | 2022-02-03
US20220035235A1
Physics

MASK BLANK, TRANSFER MASK, AND SEMICONDUCTOR-DEVICE MANUFACTURING METHOD

#17 | 2021-11-25
US20210364909A1
Physics

Mask blank, phase shift mask, and method of manufacturing semiconductor device

#18 | 2021-08-19
US20210255538A1
Physics

Mask blank, phase shift mask, and method for manufacturing semiconductor device

#19 | 2021-07-08
US20210208497A1
Physics

Mask blank, phase-shift mask, and method of manufacturing semiconductor device

#20 | 2021-05-06
US20210132488A1
Physics

MASK BLANK, PHASE-SHIFT MASK, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD

#21 | 2021-03-25
US20210088895A1
Physics

Mask blank, phase shift mask, and method for manufacturing semiconductor device

#22 | 2021-01-28
US20210026235A1
Physics

MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

#23 | 2020-12-31
US20200409252A1
Physics

Mask blank, phase shift mask, and method of manufacturing semiconductor device

#24 | 2020-09-10
US20200285144A1
Physics

MASK BLANK, TRANSFER MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

InventorID:

2844807 ⎘