Inventor profile of:

Douglas J. Resnick

City:

Leander, Texas

Country:

United States

Published Applications:

16

Last publication date:

2019-07-25

Top Assignees for applications by Douglas J. Resnick

The entities that hold a legal rights for patent applications filed by inventor Resnick Douglas J.:

Recent patent applications by Resnick Douglas J.

Douglas J. Resnick from Leander, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2019-07-25
US20190227437A1
Physics

Superstrate and a method of using the same

#2 | 2019-06-13
US20190179228A1
Physics

Imprint system and imprinting process with spatially non-uniform illumination

#3 | 2019-03-14
US20190080922A1
Electricity

Planarization process and apparatus

#4 | 2018-08-30
US20180247823A1
Electricity

Method for forming planarized etch mask structures over existing topography

#5 | 2013-06-20
US20130153534A1
Performing operations; transporting

Fabrication of seamless large area master templates for imprint lithography using step and repeat tools

#6 | 2012-05-10
US20120111832A1
Physics

Template pillar formation

#7 | 2011-07-28
US20110183521A1
Physics

Methods and systems of material removal and pattern transfer

#8 | 2011-07-14
US20110171340A1
Electricity

Template having a varying thickness to facilitate expelling a gas positioned between a substrate and the template

#9 | 2010-11-18
US20100291257A1
Electricity

Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template

#10 | 2010-05-06
US20100112310A1
Physics

Substrate Patterning

#11 | 2010-04-29
US20100102029A1
Physics

Imprint lithography template

#12 | 2010-04-22
US20100099047A1
Performing operations; transporting

MANUFACTURE OF DROP DISPENSE APPARATUS

#13 | 2010-04-15
US20100092599A1
Physics

Complementary Alignment Marks for Imprint Lithography

#14 | 2010-04-08
US20100085555A1
Physics

In-situ cleaning of an imprint lithography tool

#15 | 2010-04-01
US20100078846A1
Physics

Particle Mitigation for Imprint Lithography

#16 | 2010-02-18
US20100040718A1
Physics

Template having a silicon nitride, silicon carbide or silicon oxynitride film

InventorID:

293583 ⎘