Michael N. Miller

Configuring optical layers in imprint lithography processes

#2 | 2019-10-17

US20190317399A1

Configuring optical layers in imprint lithography processes

#3 | 2019-08-01

US20190232533A1

Strain and kinetics control during separation phase of imprint process

#4 | 2018-08-02

US20180217495A1

Configuring optical layers in imprint lithography processes

#5 | 2015-09-10

US20150255640A1

Nanostructured solar cell

#6 | 2014-05-01

US20140117574A1

Strain and Kinetics Control During Separation Phase of Imprint Process

#7 | 2013-08-22

US20130214452A1

Large area imprint lithography

#8 | 2013-06-20

US20130153534A1

Fabrication of seamless large area master templates for imprint lithography using step and repeat tools

#9 | 2012-08-23

US20120214066A1

High Aspect Ratio Patterning of Silicon

#10 | 2012-07-26

US20120187085A1

Critical dimension control during template formation

#11 | 2012-05-10

US20120111832A1

Template pillar formation

#12 | 2011-11-17

US20110277833A1

BACKSIDE CONTACT SOLAR CELL

#13 | 2011-11-17

US20110277827A1

Nanostructured solar cell

#14 | 2011-09-08

US20110215503A1

Reducing Adhesion between a Conformable Region and a Mold

#15 | 2011-08-04

US20110189329A1

Ultra-Compliant Nanoimprint Lithography Template

#16 | 2011-07-28

US20110183521A1

Methods and systems of material removal and pattern transfer

#17 | 2011-07-28

US20110183027A1

Micro-conformal templates for nanoimprint lithography

#18 | 2011-07-28

US20110180127A1

SOLAR CELL FABRICATION BY NANOIMPRINT LITHOGRAPHY

#19 | 2011-06-16

US20110140306A1

Composition for an Etching Mask Comprising a Silicon-Containing Material

#20 | 2010-05-06

US20100112310A1

Substrate Patterning

#21 | 2010-05-06

US20100109194A1

Master template replication

#22 | 2010-04-29

US20100102469A1

Strain and kinetics control during separation phase of imprint process

#23 | 2010-04-22

US20100095862A1

Double Sidewall Angle Nano-Imprint Template

#24 | 2009-11-05

US20090272875A1

Composition to reduce adhesion between a conformable region and a mold

#25 | 2009-08-27

US20090212012A1

CRITICAL DIMENSION CONTROL DURING TEMPLATE FORMATION

#26 | 2009-08-13

US20090200266A1

Template Pillar Formation

#27 | 2009-05-21

US20090130598A1

Method of creating a template employing a lift-off process

#28 | 2008-12-11

US20080303187A1

Imprint Fluid Control

#29 | 2008-04-24

US20080097065A1

Composition for an etching mask comprising a silicon-containing material

#30 | 2007-11-29

US20070272825A1

Composition to Reduce Adhesion Between a Conformable Region and a Mold

#31 | 2007-06-07

US20070126156A1

Technique for separating a mold from solidified imprinting material

#32 | 2007-06-07

US20070126150A1

Bifurcated contact printing technique

#33 | 2006-11-30

US20060266916A1

Imprint lithography template having a coating to reflect and/or absorb actinic energy

#34 | 2006-11-23

US20060263605A1

Optical and optoelectronic articles

#35 | 2006-09-12

US10245231

Optical and optoelectronic articles

#36 | 2006-08-10

US20060177532A1

Imprint lithography method to control extrusion of a liquid from a desired region on a substrate

#37 | 2006-05-25

US20060111454A1

Composition to reduce adhesion between a conformable region and a mold

#38 | 2006-05-25

US20060108710A1

Method to reduce adhesion between a conformable region and a mold

#39 | 2006-03-23

US20060063387A1

Method of patterning surfaces while providing greater control of recess anisotropy

#40 | 2006-03-23

US20060063359A1

Patterning substrates employing multi-film layers defining etch-differential interfaces

#41 | 2005-10-20

US20050230882A1

Method of forming a deep-featured template employed in imprint lithography

#42 | 2005-09-01

US20050192421A1

Composition for an etching mask comprising a silicon-containing material

#43 | 2005-08-16

US10442396

Embedded electrical traces

#44 | 2005-06-02

US20050116235A1