Inventor profile of:

James R. Shealy

City:

Ithaca, New York

Country:

United States

Published Applications:

15

Last publication date:

2026-03-05

Top Assignees for applications by James R. Shealy

The entities that hold a legal rights for patent applications filed by inventor Shealy James R.:

Recent patent applications by Shealy James R.

James R. Shealy from Ithaca, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2026-03-05
US20260068559A1
Electricity

VERTICAL GALLIUM NITRIDE CONTAINING FIELD EFFECT TRANSISTOR WITH SILICON NITRIDE PASSIVATION AND GATE DIELECTRIC REGIONS

#2 | 2025-12-30
US18068413
Electricity

Vertical gallium nitride containing field effect transistor with silicon nitride passivation and gate dielectric regions

#3 | 2024-08-20
US18045071
Electricity

Method for implant and anneal for high voltage field effect transistors

#4 | 2024-06-27
US20240213363A1
Electricity

VERTICAL FIELD EFFECT TRANSISTOR DEVICE AND METHOD OF FABRICATION

#5 | 2023-11-30
US20230387289A1
Electricity

Vertical field effect transistor device and method of fabrication

#6 | 2023-01-12
US20230010911A1
Electricity

Beryllium doped GaN-based light emitting diode and method

#7 | 2023-01-12
US20230008120A1
Electricity

Beryllium doped GaN-based light emitting diode and method

#8 | 2022-10-11
US16813337
Electricity

Beryllium doped GaN-based light emitting diode and method

#9 | 2022-05-05
US20220140130A1
Electricity

Vertical field effect transistor device and method of fabrication

#10 | 2022-02-15
US16814886
Electricity

Vertical field effect transistor device and method of fabrication

#11 | 2013-06-20
US20130153963A1
Electricity

Gated III-V semiconductor structure and method

#12 | 2012-06-21
US20120156895A1
Electricity

Chemical vapor deposition process for aluminum silicon nitride

#13 | 2012-06-21
US20120156836A1
Electricity

Method for forming III-V semiconductor structures including aluminum-silicon nitride passivation

#14 | 2012-06-21
US20120153301A1
Electricity

III-V semiconductor structures including aluminum-silicon nitride passivation

#15 | 2006-09-07
US20060199364A1
Electricity

Single step, high temperature nucleation process for a lattice mismatched substrate

InventorID:

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