Albany, New York
United States
18
2024-06-20
The entities that hold a legal rights for patent applications filed by inventor Sieg Stuart:
Stuart Sieg from Albany, US has applied for patents for these inventions. The list has both pending applications and granted patents:
STACKED TRANSISTORS WITH STEPPED CONTACTS
#2 | 2024-06-20DIELECTRIC FILLED ALIGNMENT MARK STRUCTURES
#3 | 2024-05-30SEPARATE EPITAXY IN MONOLITHIC STACKED AND STEPPED NANOSHEETS
#4 | 2024-02-29STACKED FET SUBSTRATE CONTACT
#5 | 2023-12-28COMMON SELF ALIGNED GATE CONTACT FOR STACKED TRANSISTOR STRUCTURES
#6 | 2023-12-21SHALLOW AND DEEP CONTACTS WITH STITCHING
#7 | 2023-12-14VIA CONNECTION TO BACKSIDE POWER DELIVERY NETWORK
#8 | 2023-10-05High aspect ratio contact structure with multiple metal stacks
#9 | 2023-06-08INTEGRATING GATE-CUTS AND SINGLE DIFFUSION BREAK ISOLATION POST-RMG USING LOW-TEMPERATURE PROTECTIVE LINERS
#10 | 2023-06-08BURIED POWER RAIL AT TIGHT CELL-TO-CELL SPACE
#11 | 2023-05-18REPLACEMENT BURIED POWER RAIL
#12 | 2023-05-11Bottom contact for stacked GAA FET
#13 | 2023-05-04STRUCTURE CONTAINING A VIA-TO-BURIED POWER RAIL CONTACT STRUCTURE OR A VIA-TO-BACKSIDE POWER RAIL CONTACT STRUCTURE
#14 | 2023-05-04Structure and method to pattern pitch lines
#15 | 2023-03-30Buried power rails located in a base layer including first, second, and third etch stop layers
#16 | 2022-03-31Using a same mask for direct print and self-aligned double patterning of nanosheets
#17 | 2021-01-21Using a same mask for direct print and self-aligned double patterning of nanosheets
#18 | 2020-12-31Selective source/drain recess for improved performance, isolation, and scaling
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