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Inventor profile of:

Klaus Edinger

City:

Lorsch

Country:

Germany

Published Applications:

Last publication date:

2026-02-19

Top Assignees for applications by Klaus Edinger

The entities that hold a legal rights for patent applications filed by inventor Edinger Klaus:

Carl Zeiss SMT GmbH 11 Oberkochen, Germany
CARL ZEISS SMS GMBH 9 Jena, Germany
Carl Zeiss Microscopy, LLC 3 Thornwood, NY United States
NAWOTEC GMBH 1 Jena, Germany
ALIS CORPORATION 1 Peabody, MA United States

Recent patent applications by Edinger Klaus

Klaus Edinger from Lorsch, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2026-02-19

US20260050208A1

Physics

REMOTE-PLASMA ELECTRON-INDUCED MASK REPAIR

#2 | 2024-09-05

US20240295833A1

Physics

APPARATUS AND METHOD FOR REMOVING A SINGLE PARTICULATE FROM A SUBSTRATE

#3 | 2022-10-06

US20220317565A1

Physics

Method and apparatuses for disposing of excess material of a photolithographic mask

#4 | 2022-10-06

US20220317564A1

Physics

Method and apparatuses for disposing of excess material of a photolithographic mask

#5 | 2022-09-22

US20220299864A1

Physics

METHOD AND APPARATUSES FOR DISPOSING OF EXCESS MATERIAL OF A PHOTOLITHOGRAPHIC MASK

#6 | 2022-01-13

US20220011682A1

Physics

Apparatus and method for removing a single particulate from a substrate

#7 | 2021-08-12

US20210247336A1

Physics

Device and method for analyzing a defect of a photolithographic mask or of a wafer

#8 | 2020-04-02

US20200103751A1

Physics

Method and apparatuses for disposing of excess material of a photolithographic mask

#9 | 2018-04-19

US20180106831A1

Physics

METHOD AND APPARATUS FOR ANALYZING AND FOR REMOVING A DEFECT OF AN EUV PHOTOMASK

#10 | 2017-10-12

US20170292923A1

Physics

Device and method for analysing a defect of a photolithographic mask or of a wafer

#11 | 2017-04-13

US20170102407A1

Physics

Scanning probe microscope and method for examining a surface with a high aspect ratio

#12 | 2016-11-24

US20160341763A1

Physics

Apparatus and method for examining a surface of a mask

#13 | 2015-07-30

US20150213997A1

Electricity

Ion sources, systems and methods

#14 | 2014-10-16

US20140306121A1

Electricity

Ion sources, systems and methods

#15 | 2014-06-12

US20140165236A1

Physics

Method and apparatus for analyzing and for removing a defect of an EUV photomask

#16 | 2014-01-30

US20140027512A1

Physics

Apparatus and method for investigating an object

#17 | 2014-01-02

US20140007306A1

Physics

Apparatus and method for analyzing and modifying a specimen surface

#18 | 2013-06-20

US20130156939A1

Physics

Method and apparatus for analyzing and/or repairing of an EUV mask defect

#19 | 2012-06-07

US20120141693A1

Electricity

Ion sources, systems and methods

#20 | 2011-09-01

US20110210181A1

Chemistry; metallurgy

Apparatus and method for investigating and/or modifying a sample

#21 | 2011-07-28

US20110183523A1

Electricity

Method for electron beam induced etching of layers contaminated with gallium

#22 | 2011-07-28

US20110183517A1

Chemistry; metallurgy

Method for electron beam induced deposition of conductive material

#23 | 2011-07-28

US20110183444A1

Electricity

Method for electron beam induced etching

#24 | 2010-11-25

US20100297362A1

Physics

METHOD FOR PROCESSING AN OBJECT WITH MINIATURIZED STRUCTURES

#25 | 2010-11-11

US20100282596A1

Chemistry; metallurgy

Methods and systems for removing a material from a sample

InventorID:

299077 ⎘