Thorsten Hofmann

APPARATUS FOR ANALYZING AND/OR PROCESSING A SAMPLE WITH A PARTICLE BEAM AND METHOD

METHOD FOR PARTICLE BEAM-INDUCED PROCESSING OF A DEFECT OF A MICROLITHOGRAPHIC PHOTOMASK

Device and method for analyzing a defect of a photolithographic mask or of a wafer

Method and device for permanently repairing defects of absent material of a photolithographic mask

METHOD AND APPARATUS FOR ANALYZING AND FOR REMOVING A DEFECT OF AN EUV PHOTOMASK

Device and method for analysing a defect of a photolithographic mask or of a wafer

Method and device for permanently repairing defects of absent material of a photolithographic mask

Apparatus and method for examining a surface of a mask

METHOD AND APPARATUS FOR PROTECTING A SUBSTRATE DURING PROCESSING BY A PARTICLE BEAM

Method and apparatus for analyzing and for removing a defect of an EUV photomask

Apparatus and method for investigating an object

Apparatus and method for analyzing and modifying a specimen surface

Method and apparatus for analyzing and/or repairing of an EUV mask defect

Method and apparatus for processing a substrate with a focused particle beam

Apparatus and method for investigating and/or modifying a sample

Method for electron beam induced etching of layers contaminated with gallium

Method for electron beam induced deposition of conductive material

Method for electron beam induced etching

METHOD FOR PROCESSING AN OBJECT WITH MINIATURIZED STRUCTURES

Methods and systems for removing a material from a sample

Apparatus and method for investigating or modifying a surface with a beam of charged particles

Method for high-resolution processing of thin layers using electron beams