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Inventor profile of:

Andreas Klipp

City:

Lambsheim

Country:

Germany

Published Applications:

23

Last publication date:

2020-08-13

Top Assignees for applications by Andreas Klipp

The entities that hold a legal rights for patent applications filed by inventor Klipp Andreas:

BASF SE 20 Ludwigshafen, Germany
BASF SE 3 Ludwigshafen am Rhein, Germany
BAFS SE 1 Ludwigshafen, Germany

Recent patent applications by Klipp Andreas

Andreas Klipp from Lambsheim, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2020-08-13

US20200255713A1

Chemistry; metallurgy

Chemical-mechanical polishing composition comprising benzotriazole derivatives as corrosion inhibitors

#2 | 2019-01-03

US20190002802A1

Chemistry; metallurgy

Composition for post chemical-mechanical-polishing cleaning

#3 | 2018-12-27

US20180371371A1

Chemistry; metallurgy

Composition for post chemical-mechanical-polishing cleaning

#4 | 2018-07-19

US20180201885A1

Chemistry; metallurgy

Defect reduction rinse solution containing ammonium salts of sulfoesters

#5 | 2016-08-18

US20160238944A9

USE OF COMPOSITIONS COMPRISING A SURFACTANT AND A HYDROPHOBIZER FOR AVOIDING ANTI PATTERN COLLAPSE WHEN TREATING PATTERNED MATERIALS WITH LINE-SPACE DIMENSIONS OF 50 NM OR BELOW

#6 | 2016-07-14

US20160200943A1

Chemistry; metallurgy

Chemical-mechanical polishing composition comprising benzotriazole derivatives as corrosion inhibitors

#7 | 2016-06-09

US20160161846A1

Use of surfactants having at least three short-chain perfluorinated groups in formulations for photo mask cleaning

#8 | 2015-11-12

US20150323871A1

Use of compositions comprising a surfactant and a hydrophobizer for avoiding anti pattern collapse when treating patterned materials with line-space dimensions of 50 nm or below

#9 | 2015-07-09

US20150192854A1

COMPOSITION FOR MANUFACTURING INTEGRATED CIRCUIT DEVICES, OPTICAL DEVICES, MICROMACHINES AND MECHANICAL PRECISION DEVICES

#10 | 2015-06-11

US20150159123A1

Chemistry; metallurgy

Compositions for anti pattern collapse treatment comprising gemini additives

#11 | 2015-02-12

US20150044839A1

Photoresist stripping and cleaning composition, method of its preparation and its use

#12 | 2014-01-09

US20140011366A1

Method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices having patterned material layers with line-space dimensions of 50 nm and less

#13 | 2014-01-09

US20140011359A1

Aqueous, nitrogen-free cleaning composition and its use for removing residues and contaminants from semiconductor substrates suitable for manufacturing microelectronic devices

#14 | 2013-10-31

US20130288484A1

Use of surfactants having at least three short-chain perfluorinated groups RF for manufacturing integrated circuits having patterns with line-space dimensions below 50 NM

#15 | 2013-07-04

US20130171765A1

Aqueous acidic solution and etching solution and method for texturizing the surface of single crystal and polycrystal silicon substrates

#16 | 2013-06-20

US20130157919A1

Chemistry; metallurgy

Aqueous alkaline cleaning compositions and methods of their use

#17 | 2012-05-24

US20120129747A1

Post ion implant stripper for advanced semiconductor application

#18 | 2012-04-19

US20120094886A1

Chemistry; metallurgy

Aqueous alkaline cleaning compositions and methods of their use

#19 | 2012-03-08

US20120058644A1

Resist stripping compositions and methods for manufacturing electrical devices

#20 | 2012-02-16

US20120040529A1

Resist stripping compositions and methods for manufacturing electrical devices

#21 | 2012-01-26

US20120021961A1

Chemistry; metallurgy

COMPOSITION FOR POST CHEMICAL-MECHANICAL POLISHING CLEANING

#22 | 2011-03-31

US20110076416A1

METHOD OF MAKING POROUS MATERIALS AND POROUS MATERIALS PREPARED THEREOF

#23 | 2011-02-24

US20110046314A1

Low-k dielectrics obtainable by twin polymerization

InventorID:

300876 ⎘