Andre Poock

City:

Malschwitz

Country:

Germany

Published Applications:

Last publication date:

2012-01-05

Top Assignees for applications by Andre Poock

The entities that hold a legal rights for patent applications filed by inventor Poock Andre:

Andre Poock from Malschwitz, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

Method and system for excursion monitoring in optical lithography processes in micro device fabrication

SELF-CORRECTING SUBSTRATE SUPPORT SYSTEM FOR FOCUS CONTROL IN EXPOSURE SYSTEMS

Method of detecting repeating defects in lithography masks on the basis of test substrates exposed under varying conditions

InventorID:

3066920 ⎘