Dresden
Germany
10
2012-01-05
The entities that hold a legal rights for patent applications filed by inventor Seltmann Rolf:
Rolf Seltmann from Dresden, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
Control of critical dimensions in optical imaging processes for semiconductor production by extracting imaging imperfections on the basis of imaging tool specific intensity measurements and simulations
#2 | 2010-09-30Method and apparatus for dispatching workpieces to tools based on processing and performance history
#3 | 2010-09-30Method and system for detecting particle contamination in an immersion lithography tool
#4 | 2010-05-06FOCUS CORRECTION IN LITHOGRAPHY TOOLS VIA LENS ABERRATION CONTROL
#5 | 2010-02-04Method and system for reducing overlay errors in semiconductor volume production using a mixed tool scenario
#6 | 2008-03-06Method and system for reducing overlay errors within exposure fields by APC control strategies
#7 | 2007-03-01Method and system for automatically detecting exposed substrates having a high probability for defocused exposure fields
#8 | 2006-02-28Method and system for improving exposure uniformity in a step and repeat process
#9 | 2005-09-20Method and system for improving the efficiency of a mechanical alignment tool
#10 | 2005-06-02Method and system for increasing product yield by controlling lithography on the basis of electrical speed data
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