Cem Basceri

One-transistor composite-gate memory

Methods of forming conductive contacts to source/drain regions and methods of forming local interconnects

Solid state lighting devices with reduced crystal lattice dislocations and associated methods of manufacturing

Methods and systems for controlling temperature during microfeature workpiece processing, E.G., CVD deposition

Integrated circuitry

Methods of titanium deposition

One-transistor composite-gate memory

Integrated circuitry

Dielectric relaxation memory

Supercritical fluid-assisted direct write for printing integrated circuits

Methods of titanium deposition

Semiconductor device

Methods of programming memory cells using manipulation of oxygen vacancies

One-transistor composite-gate memory

Silicon carbide dimpled substrate

Method of forming a layer comprising epitaxial silicon

Methods of forming capacitor constructions

Method of forming conductive metal silicides by reaction of metal with silicon

ATOMIC LAYER DEPOSITION METHOD

DRAM constructions and electronic systems

Semiconductor device comprising a junction having a plurality of rings

Methods of forming conductive contacts to source/drain regions and methods of forming local interconnects

Methods of forming conductive contacts to source/drain regions and methods of forming local interconnects

Method of manufacturing gallium nitride based high-electron mobility devices

Method of manufacturing an adaptive AIGaN buffer layer

Gallium nitride based high-electron mobility devices

Supercritical fluid-assisted direct write for printing integrated circuits

Integrated circuitry

Semiconductor device including container having epitaxial silicon therein

Methods of forming vertical transistor structures

Methods of forming vertical transistor structures

Methods of forming field effect transistors

One-transistor composite-gate memory

Methods of forming conductive contacts to source/drain regions and methods of forming local interconnects

Capacitor constructions

Vertical junction field effect transistor having an epitaxial gate

Methods and apparatus for processing microfeature workpieces, e.g., for depositing materials on microfeature workpieces

Methods and apparatus for processing microfeature workpieces, e.g., for depositing materials on microfeature workpieces

Methods and systems for controlling temperature during microfeature workpiece processing, E.G. CVD deposition

Method of manufacturing a vertical junction field effect transistor having an epitaxial gate

Microfeature workpiece processing apparatus and methods for batch deposition of materials on microfeature workpieces

Systems for depositing material onto workpieces in reaction chambers and methods for removing byproducts from reaction chambers

Method of forming semi-insulating silicon carbide single crystal

Dielectric relaxation memory

Dielectric relaxation memory

Methods of forming a layer comprising epitaxial silicon, and methods of forming field effect transistors

Methods and systems for determining physical parameters of features on microfeature workpieces

Methods of forming conductive contacts to source/drain regions and methods of forming local interconnects

Method of forming a layer comprising epitaxial silicon and a field effect transistor

Method of forming a layer comprising epitaxial silicon

Method of forming epitaxial silicon-comprising material

Method of forming a vertical transistor

Method of forming a vertical transistor

Methods of forming vertical transistor structures

One-transistor composite-gate memory

Dielectric relaxation memory

Methods of forming field effect transistors

Gated field effect devices

Semiconductor substrate

Methods of growing epitaxial silicon

Methods of forming a gated device

Gated field effect device comprising gate dielectric having different K regions

Reactors, systems and methods for depositing thin films onto microfeature workpieces

Methods of forming conductive material silicides by reaction of metal with silicon

Methods of forming conductive metal silicides by reaction of metal with silicon

Integrated capacitors fabricated with conductive metal oxides