Inventor profile of:

Peter Loewenhardt

City:

Pleasanton, California

Country:

United States

Published Applications:

20

Last publication date:

2012-02-09

Top Assignees for applications by Peter Loewenhardt

The entities that hold a legal rights for patent applications filed by inventor Loewenhardt Peter:

Recent patent applications by Loewenhardt Peter

Peter Loewenhardt from Pleasanton, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2012-02-09
US20120031426A1
Chemistry; metallurgy

Methods for preventing corrosion of plasma-exposed yttria-coated constituents

#2 | 2011-10-27
US20110263130A1
Electricity

Methods for RF pulsing of a narrow gap capacitively coupled reactor

#3 | 2011-07-12
US10431030
-

RF pulsing of a narrow gap capacitively coupled reactor

#4 | 2011-03-24
US20110067814A1
Electricity

Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a multi-part electrode

#5 | 2011-01-04
US10445146
-

Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a multi-part electrode

#6 | 2009-01-22
US20090020417A1
Chemistry; metallurgy

Methods of sputtering a protective coating on a semiconductor substrate

#7 | 2008-09-04
US20080210377A1
Electricity

Uniform etch system

#8 | 2008-05-13
US10642083
-

Uniform etch system

#9 | 2007-12-13
US20070287292A1
Electricity

Preventing damage to low-k materials during resist stripping

#10 | 2007-11-13
US10860833
-

Method for plasma stripping using periodic modulation of gas chemistry and hydrocarbon addition

#11 | 2007-06-07
US20070128849A1
Electricity

WAFERLESS AUTOMATIC CLEANING AFTER BARRIER REMOVAL

#12 | 2007-06-05
US10866382
-

Preventing damage to low-k materials during resist stripping

#13 | 2007-01-30
US10318612
-

Gas distribution system with tuning gas

#14 | 2006-05-09
US10348724
-

Method for selectively etching organosilicate glass with respect to a doped silicon carbide

#15 | 2006-03-09
US20060051967A1
Electricity

Wafer bevel polymer removal

#16 | 2005-12-15
US20050277289A1
Electricity

Line edge roughness reduction for trench etch

#17 | 2005-10-20
US20050233590A1
Electricity

Waferless automatic cleaning after barrier removal

#18 | 2005-06-23
US20050133164A1
Electricity

Temperature controlled hot edge ring assembly for reducing plasma reactor etch rate drift

#19 | 2005-05-12
US20050101126A1
Electricity

Line edge roughness reduction for trench etch

#20 | 2005-01-11
US10180978
-

Plasma processor with electrode simultaneously responsive to plural frequencies

InventorID:

3091612 ⎘