Maki Tanaka

City:

Mito

Country:

Japan

Published Applications:

Last publication date:

2012-10-25

Top Assignees for applications by Maki Tanaka

The entities that hold a legal rights for patent applications filed by inventor Tanaka Maki:

Maki Tanaka from Mito, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

Electron microscope system and method for evaluating film thickness reduction of resist patterns

Scanning electron microscope system and method for measuring dimensions of patterns formed on semiconductor device by using the system

Pattern measuring apparatus and computer program

METHOD FOR MEASURING A PATTERN DIMENSION

SCANNING ELECTRON MICROSCOPE AND METHOD OF MEASURING PATTERN DIMENSION USING THE SAME

Scanning electron microscope system and method for measuring dimensions of patterns formed on semiconductor device by using the system

Electron microscope system and method for evaluating film thickness reduction of resist patterns

Method and its system for calibrating measured data between different measuring tools

InventorID:

3097635 ⎘