Inventor profile of:

Michael Layh

City:

Aalen

Country:

Germany

Published Applications:

17

Last publication date:

2012-11-22

Top Assignees for applications by Michael Layh

The entities that hold a legal rights for patent applications filed by inventor Layh Michael:

Recent patent applications by Layh Michael

Michael Layh from Aalen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2012-11-22
US20120293784A1
Physics

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

#2 | 2012-09-27
US20120242968A1
Physics

Method for adjusting an illumination system of a projection exposure apparatus for projection lithography

#3 | 2012-06-21
US20120153189A1
Physics

OPTICAL SYSTEM FOR GENERATING A LIGHT BEAM FOR TREATING A SUBSTRATE

#4 | 2012-03-01
US20120050703A1
Physics

EUV collector with cooling device

#5 | 2011-07-21
US20110177463A1
Physics

Illumination system for EUV microlithography

#6 | 2011-05-05
US20110102758A1
Physics

Illumination system for a microlithography projection exposure apparatus, microlithography projection exposure apparatus comprising such an illumination system, and fourier optical system

#7 | 2011-04-28
US20110096317A1
Physics

Component for setting a scan-integrated illumination energy in an object plane of a microlithography projection exposure apparatus

#8 | 2011-04-14
US20110083542A1
Physics

Optical integrator for an illumination system of a microlithographic projection exposure apparatus

#9 | 2010-11-11
US20100283985A1
Physics

Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation

#10 | 2010-11-11
US20100283984A1
Physics

Microlithographic projection exposure apparatus

#11 | 2010-10-21
US20100265482A1
Physics

Illumination system for illuminating a mask in a microlithographic exposure apparatus

#12 | 2010-06-24
US20100157269A1
Physics

Illumination system having a beam deflection array for illuminating a mask in a microlithographic projection exposure apparatus

#13 | 2010-02-18
US20100039629A1
Physics

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

#14 | 2009-10-22
US20090262324A1
Physics

ILLUMINATION OPTICS FOR PROJECTION MICROLITHOGRAPHY AND RELATED METHODS

#15 | 2009-01-22
US20090021839A1
Physics

Optical integrator for an illumination system of a microlithographic projection exposure apparatus

#16 | 2009-01-22
US20090021716A1
Physics

Illumination system for a microlithographic projection exposure apparatus

#17 | 2009-01-22
US20090021715A1
Physics

Microlithographic illumination system

InventorID:

3109119 ⎘