Dresden
Germany
8
2012-06-21
The entities that hold a legal rights for patent applications filed by inventor Werner Thomas:
Thomas Werner from Dresden, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
Performance Enhancement in Metallization Systems of Microstructure Devices by Incorporating an Intermediate Barrier Layer
#2 | 2012-03-153-D integrated semiconductor device comprising intermediate heat spreading capabilities
#3 | 2007-04-05Technique for creating different mechanical strain in different CPU regions by forming an etch stop layer having differently modified intrinsic stress
#4 | 2006-04-18Method of forming a cap layer having anti-reflective characteristics on top of a low-k dielectric
#5 | 2006-04-04Nitrogen-enriched low-k barrier layer for a copper metallization layer
#6 | 2005-11-15Void formation monitoring in a damascene process
#7 | 2005-05-17Barrier layer for a copper metallization layer including a low-k dielectric
#8 | 2005-03-15Test structure for determining the stability of electronic devices comprising connected substrates
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