Uiwang-si
South Korea
8
2015-04-30
The entities that hold a legal rights for patent applications filed by inventor HWANG Eun-Ha:
Eun-Ha HWANG from Uiwang-si, KR has applied for patents for these inventions. The list has both pending applications and granted patents:
Positive Photosensitive Resin Composition, Photosensitive Resin Film Prepared by Using the Same, and Display Device
#2 | 2015-02-19Positive photosensitive resin composition, and photosensitive resin film and display device prepared by using the same
#3 | 2014-07-03Photosensitive resin composition for insulating film of display device, insulating film using the same, and display device using the same
#4 | 2014-06-19Positive photosensitive resin composition
#5 | 2013-07-04Positive photosensitive resin composition, and photosensitive resin layer and display device using the same
#6 | 2013-07-04Positive photosensitive resin composition, and display device and organic light emitting device using the same
#7 | 2013-06-27Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film
#8 | 2013-05-30Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film
312195 ⎘