Inventor profile of:

Deepak Ramappa

City:

Cambridge, Massachusetts

Country:

United States

Published Applications:

15

Last publication date:

2012-11-15

Top Assignees for applications by Deepak Ramappa

The entities that hold a legal rights for patent applications filed by inventor Ramappa Deepak:

Recent patent applications by Ramappa Deepak

Deepak Ramappa from Cambridge, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2012-11-15
US20120289030A1
Chemistry; metallurgy

Ion-assisted direct growth of porous materials

#2 | 2012-11-15
US20120288637A1
Chemistry; metallurgy

Methods of affecting material properties and applications therefor

#3 | 2012-06-21
US20120156860A1
Electricity

Pressurized treatment of substrates to enhance cleaving process

#4 | 2012-04-10
US13041724
-

Self-aligned process and method for fabrication of high efficiency solar cells

#5 | 2012-03-29
US20120077305A1
Electricity

Controlling laser annealed junction depth by implant modification

#6 | 2012-03-29
US20120074117A1
Electricity

IN-SITU HEATING AND CO-ANNEALING FOR LASER ANNEALED JUNCTION FORMATION

#7 | 2011-11-10
US20110275173A1
Electricity

Isolation by implantation in LED array manufacturing

#8 | 2011-08-18
US20110201176A1
Electricity

Pressurized treatment of substrates to enhance cleaving process

#9 | 2011-04-28
US20110097840A1
Electricity

Reducing surface recombination and enhancing light trapping in solar cells

#10 | 2010-06-24
US20100155909A1
Electricity

Method to enhance charge trapping

#11 | 2010-05-06
US20100112788A1
Electricity

METHOD TO REDUCE SURFACE DAMAGE AND DEFECTS

#12 | 2010-05-06
US20100110239A1
Electricity

Dark currents and reducing defects in image sensors and photovoltaic junctions

#13 | 2010-02-18
US20100041246A1
Electricity

Cleaving of substrates

#14 | 2009-09-10
US20090227097A1
Electricity

Use of dopants with different diffusivities for solar cell manufacture

#15 | 2009-09-10
US20090227087A1
Electricity

Method to improve uniformity of chemical mechanical polishing planarization

InventorID:

3129404 ⎘