Shanghai
China
7
2016-06-02
The entities that hold a legal rights for patent applications filed by inventor BAO Wayne:
Wayne BAO from Shanghai, CN has applied for patents for these inventions. The list has both pending applications and granted patents:
Semiconductor device with three or four-terminal-FinFET
#2 | 2015-10-22Method for forming fin FET structure with dual-stress spacers
#3 | 2015-01-22Semiconductor device and manufacturing method thereof
#4 | 2014-06-19Fabrication method for semiconductor device with three or four-terminal-FinFET
#5 | 2014-03-20Semiconductor device and manufacturing method thereof
#6 | 2013-12-26Metal silicide layer, NMOS transistor, and fabrication method
#7 | 2013-07-04Fin FET structure with dual-stress spacers and method for forming the same
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