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Inventor profile of:

Aurelian DODOC

City:

Oberkochen

Country:

Germany

Published Applications:

Last publication date:

2012-06-28

Top Assignees for applications by Aurelian DODOC

The entities that hold a legal rights for patent applications filed by inventor DODOC Aurelian:

CARL ZEISS SMT AG 24 Oberkochen, Germany
Carl Zeiss SMT GmbH 6 Oberkochen, Germany
Carl Zeiss SMT AG 1 , Germany
Carl Zeis SMT AG 1 Oberkochen, Germany
CARL ZEISS SMT AG 1 73447 OBERKOCHEN GERMANY, Germany

Recent patent applications by DODOC Aurelian

Aurelian DODOC from Oberkochen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2012-06-28

US20120162625A1

Physics

Catadioptric projection objective with intermediate images

#2 | 2010-12-23

US20100323299A1

Physics

Projection objective for immersion lithography

#3 | 2009-05-21

US20090128896A1

Physics

CATADIOPTRIC PROJECTION OBJECTIVE WITH INTERMEDIATE IMAGE

#4 | 2009-03-19

US20090073392A1

Physics

Illumination System Including Grazing Incidence Mirror For Microlithography Exposure System

#5 | 2009-02-05

US20090034061A1

Physics

Catadioptric projection objective with intermediate images

#6 | 2008-12-25

US20080316456A1

Physics

CATADIOPTRIC PROJECTION OBJECTIVE WITH GEOMETRIC BEAM SPLITTING

#7 | 2008-09-04

US20080213703A1

Physics

Imaging system with mirror group

#8 | 2008-08-14

US20080192359A1

Physics

Illumination system for a microlithgraphic exposure apparatus

#9 | 2008-02-21

US20080043345A1

Physics

Refractive projection objective for immersion lithography

#10 | 2008-02-14

US20080037111A1

Physics

Catadioptric projection objective

#11 | 2007-11-22

US20070268594A1

Physics

Projection optical system

#12 | 2007-11-08

US20070258152A1

Physics

Projection optical system

#13 | 2007-11-08

US20070258134A1

Physics

Lithography lens system and projection exposure system provided with at least one lithography lens system of this type

#14 | 2007-10-11

US20070236674A1

Physics

Catadioptric projection objective

#15 | 2007-08-23

US20070195423A1

Physics

Projection exposure apparatus

#16 | 2007-05-17

US20070109659A1

Physics

Refractive projection objective for immersion lithography

#17 | 2007-01-25

US20070019170A1

Physics

Projection objective for a microlithographic projection exposure apparatus

#18 | 2007-01-18

US20070013882A1

Physics

Method of manufacturing projection objectives and set of projection objectives manufactured by that method

#19 | 2006-11-30

US20060268253A1

Physics

Imaging system, in particular for a microlithographic projection exposure apparatus

#20 | 2006-11-16

US20060256447A1

Physics

Projection objective

#21 | 2006-11-14

US10805393

Catadioptric reduction lens

#22 | 2006-09-07

US20060198018A1

Physics

Imaging system

#23 | 2006-08-24

US20060187430A1

Physics

Microlithographic projection exposure apparatus

#24 | 2006-06-22

US20060132931A1

Physics

Catadioptric projection objective

#25 | 2006-05-25

US20060109560A1

Physics

Method of determining lens materials for a projection exposure apparatus

#26 | 2006-04-13

US20060077366A1

Physics

Catadioptric projection objective with geometric beam splitting

#27 | 2005-10-06

US20050219707A1

Physics

Projection objective of a microlithographic exposure apparatus

#28 | 2005-09-22

US20050207029A1

Physics

Catadioptric projection objective

#29 | 2005-09-01

US20050190455A1

Physics

Refractive projection objective for immersion lithography

#30 | 2005-09-01

US20050190435A1

Physics

Catadioptric projection objective

#31 | 2005-08-25

US20050185269A1

Physics

Catadioptric projection objective with geometric beam splitting

#32 | 2005-06-02

US20050117224A1

Physics

Catadioptric projection objective with geometric beam splitting

#33 | 2005-03-31

US20050068499A1

Physics

Microlithographic projection exposure apparatus

InventorID:

3201920 ⎘