Sinsheim
Germany
14
2026-03-12
The entities that hold a legal rights for patent applications filed by inventor WEISER Martin:
Martin WEISER from Sinsheim, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
METHOD OF TREATING A REFLECTIVE OPTICAL ELEMENT, REFLECTIVE OPTICAL ELEMENT AND OPTICAL ARRANGEMENT
#2 | 2019-01-17Device for changing a surface shape of an optical element via electron irradiation
#3 | 2018-03-01Wavefront correction element for use in an optical system
#4 | 2014-10-16Reflective Optical Element for the EUV Wavelength Range, Method for Producing and for Correcting Such an Element, Projection Lens for Microlithography Comprising Such an Element, and Projection Exposure Apparatus for Microlithography Comprising Such a Projection Lens
#5 | 2013-07-04Substrate for mirrors for EUV lithography
#6 | 2012-08-23SUBSTRATES AND MIRRORS FOR EUV MICROLITHOGRAPHY, AND METHODS FOR PRODUCING THEM
#7 | 2012-08-16Irradiation with high energy ions for surface structuring and treatment of surface proximal sections of optical elements
#8 | 2010-02-04Removing reflective layers from EUV mirrors
#9 | 2009-01-27Mirror for use in a projection exposure apparatus
#10 | 2008-06-26Irradiation with high energy ions for surface structuring and treatment of surface proximal sections of optical elements
#11 | 2006-10-10Method of manufacturing an optical element
#12 | 2006-07-18Reflecting device for electromagnetic waves
#13 | 2006-04-18Substrate material for X-ray optical components
#14 | 2005-01-11Catadioptric objective
321501 ⎘