Itami-shi
Japan
10
2018-08-23
The entities that hold a legal rights for patent applications filed by inventor Doi Hideyuki:
Hideyuki Doi from Itami-shi, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
Method for manufacturing silicon carbide epitaxial substrate, method for manufacturing silicon carbide semiconductor device, and apparatus for manufacturing silicon carbide epitaxial substrate
#2 | 2018-08-16SILICON CARBIDE EPITAXIAL SUBSTRATE
#3 | 2018-07-26Epitaxial wafer and method for manufacturing same
#4 | 2016-11-10Epitaxial wafer and method for manufacturing same
#5 | 2016-07-28Power generation apparatus
#6 | 2015-08-20SILICON CARBIDE EPITAXIAL SUBSTRATE AND METHOD OF MANUFACTURING SILICON CARBIDE EPITAXIAL SUBSTRATE
#7 | 2015-03-12Silicon carbide epitaxial substrate and method of manufacturing silicon carbide epitaxial substrate
#8 | 2013-10-03Gas decomposition component, method for producing gas decomposition component, and power generation apparatus
#9 | 2013-08-29Gas decomposition component, power generation apparatus, and method for decomposing gas
#10 | 2013-07-04GAS DECOMPOSITION COMPONENT, POWER GENERATION APPARATUS, AND METHOD FOR DECOMPOSING GAS
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