James Baugh

City:

Boise, Idaho

Country:

United States

Published Applications:

Last publication date:

2012-09-20

Top Assignees for applications by James Baugh

The entities that hold a legal rights for patent applications filed by inventor Baugh James:

James Baugh from Boise, US has applied for patents for these inventions. The list has both pending applications and granted patents:

Method and system for removal of contaminates from phaseshift photomasks

Methods for forming and cleaning photolithography reticles

Method and system for removal of contaminates from phaseshift photomasks

Method and system for removal of contaminates from phaseshift photomasks

InventorID:

3259169 ⎘